Electron energy loss spectroscopy of plasmon resonances in titanium nitride thin films

被引：16

作者：

Herzing, Andrew A. ^{[1
]}

Guler, Urcan ^{[2
,3
,4
]}

Zhou, Xiuli ^{[5
]}

Boltasseva, Alexandra ^{[2
,3
]}

Shalaev, Vladimir ^{[2
,3
]}

Norris, Theodore B. ^{[5
]}

机构：

[1] Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA

[2] Purdue Univ, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA

[3] Purdue Univ, Birck Nanotechnol Ctr, W Lafayette, IN 47907 USA

[4] Nanometa Technol Inc, 1281 Win Hentschel Blvd, W Lafayette, IN 47906 USA

[5] Univ Michigan, Ctr Ultrafast Opt Sci, Ann Arbor, MI 48109 USA

来源：

APPLIED PHYSICS LETTERS | 2016年 / 108卷 / 17期

关键词：

SILVER; SURFACE; GOLD;

D O I：

10.1063/1.4947442

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The plasmon resonance characteristics of refractory TiN thin films were analyzed using electron energy-loss spectroscopy (EELS). A bulk plasmon resonance was observed at 2.81 eV and a weaker surface plasmon resonance peak was detected at 2.05 eV. These findings are compared to finite-difference time-domain simulations based on measured optical data. The calculated values for both the bulk and surface resonances (2.74 eV and 2.15 eV, respectively) show reasonable agreement with those measured via EELS. The amplitude of the experimentally observed surface resonance was weaker than that typically encountered in noble metal nanostructures, and this is discussed in the context of electron density and reduced spatial confinement of the resonance mode in the thin-film geometry. Published by AIP Publishing.

引用

页数：4

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