Effect of SiO2/Si3N4 dielectric distributed Bragg reflectors (DDBRs) for Alq3/NPB thin-film resonant cavity organic light emitting diodes

被引:12
|
作者
Lei, Po-Hsun [1 ]
Wang, Shun-Hsi [1 ]
Juang, Fuh Shyang [1 ]
Tseng, Yung-Hsin [1 ]
Chung, Meng-Jung [1 ]
机构
[1] Natl Formosa Univ, Inst Electroopt & Mat Sci, Huwei 632, Yunlin County, Taiwan
关键词
Dielectric distributed Bragg reflectors; Resonant cavity organic light emitting diode; Full width at half maximum; EFFICIENCY; EMISSION; LEDS;
D O I
10.1016/j.optcom.2009.12.042
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In this article, we report on the effect of SiO2/Si3N4 dielectric distributed Bragg reflectors (DDBRs) for Alq(3)/NPB thin-film resonant cavity organic light emitting diode (RCOLED) in increasing the light output intensity and reducing the linewidth of spontaneous emission spectrum. The optimum DDBR number is found as 3 pairs. The device performance will be bad by further increasing or decreasing the number of DDBR. As compared to the conventional Alq(3)/NPB thin-film organic light emitting diode (OLED), the Alq(3)/NPB thin-film RCOLED with 3-pair DDBRs has the superior electrical and optical characteristics including a forward voltage of 6 V, a current efficiency of 3.4 cd/A, a luminance of 2715 cd/m(2) under the injection current density of 1000 A/m(2), and a full width at half maximum (FWHM) of 12 nm for emission spectrum over the 5-9 V bias range. These results represent that the Alq(3)/NPB thin-film OLED with DDBRs shows a potential as the light Source for plastic optical fiber (POF) communication system. Crown Copyright (C) 2010 Published by Elsevier B.V. All rights reserved.
引用
收藏
页码:1933 / 1937
页数:5
相关论文
共 50 条
  • [41] The protective effect of the SiO2 coating layer on the oxidation of Si3N4
    Lee, SH
    Auh, KH
    Choi, SC
    JOURNAL OF CERAMIC PROCESSING RESEARCH, 2001, 2 (02): : 54 - 60
  • [42] REACTOR CHARACTERIZATION FOR A PROCESS TO ETCH SI3N4 FORMED ON THIN SIO2
    RILEY, PE
    DEFONSEKA, BN
    SUM, JC
    FIGUEREDO, D
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1993, 6 (03) : 290 - 292
  • [43] Light harvesting with Ge quantum dots embedded in SiO2 or Si3N4
    Cosentino, Salvatore
    Ozen, Emel Sungur
    Raciti, Rosario
    Mio, Antonio M.
    Nicotra, Giuseppe
    Simone, Francesca
    Crupi, Isodiana
    Turan, Rasit
    Terrasi, Antonio
    Aydinli, Atilla
    Mirabella, Salvo
    JOURNAL OF APPLIED PHYSICS, 2014, 115 (04)
  • [44] Profiles of concentrations and chemical state of elements in a multilayered Si3N4/SiO2/Si film
    Ballutaud, D
    Severac, C
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1996, 52 (279): : 114 - 115
  • [45] Study on optical interference effect of graphene oxide films on SiO2 and Si3N4 dielectric films
    Jung, Inhwa
    Son, Jong Yeog
    Park, Soo-Jin
    Rhee, Kyong-Yop
    RESEARCH ON CHEMICAL INTERMEDIATES, 2014, 40 (07) : 2477 - 2486
  • [46] Study on optical interference effect of graphene oxide films on SiO2 and Si3N4 dielectric films
    Inhwa Jung
    Jong Yeog Son
    Soo-Jin Park
    Kyong-Yop Rhee
    Research on Chemical Intermediates, 2014, 40 : 2477 - 2486
  • [47] TECHNOLOGY OF SUPERCONDUCTING THIN-FILMS ON SI, SIO2, AND SI3N4 FOR VACUUM MICROELECTRONICS
    ASLAM, M
    SOLTIS, RE
    LOGOTHETIS, EM
    CHASE, RE
    WENGER, LE
    CHEN, JT
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (11) : 2693 - 2696
  • [48] High-speed transparent indium-tin-oxide based resonant cavity Schottky photodiode with Si3N4/SiO2 top Bragg mirror
    Biyikli, N.
    Kimukin, I.
    Aytur, O.
    Ozbay, E.
    Gokkavas, M.
    Unlu, S.
    Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest, 2000, : 468 - 469
  • [49] High-speed transparent indium-tin-oxide based resonant cavity Schottky photodiode with Si3N4/SiO2 top Bragg mirror
    Biyikli, N
    Kimukin, I
    Ozbay, E
    Gokkavas, M
    Unlu, S
    ULTRAFAST ELECTRONICS AND OPTOELECTRONICS, PROCEEDINGS, 2001, 49 : 129 - 133
  • [50] High Field-Effect Mobility Bottom-Gated Metallorganic Chemical Vapor Deposition ZnO Thin-Film Transistors with SiO2/Si3N4 Bilayer Gate Dielectric
    Remashan, K.
    Choi, Y. S.
    Park, S. J.
    Jang, J. H.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2010, 157 (12) : H1110 - H1115