The effect of porosity on the laser induced damage threshold of TiO2 and ZrO2 single layer films

被引:34
|
作者
Bananej, Alireza [1 ,2 ]
Hassanpour, Arnir [2 ]
Razzaghi, Hossein [1 ]
Zade, Mehdi Vaez [2 ]
Mohammadi, Ali [1 ]
机构
[1] Laser & Opt Res Inst, NSTRI, Tehran, Iran
[2] Khaje Nasireddine Toosi Univ Technol, Dept Phys, Tehran, Iran
来源
OPTICS AND LASER TECHNOLOGY | 2010年 / 42卷 / 08期
关键词
Laser damage threshold; Thermal conductivity; Porosity; THERMAL-CONDUCTIVITY; TEMPERATURE; MODEL;
D O I
10.1016/j.optlastec.2010.03.008
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Monolayer ZrO2 and TiO2 films were prepared on BK7 glass by physical vapor deposition (PVD) and were subsequently annealed for 1 h at 300 degrees C. By using the transmission spectra of two samples and the envelope method, the refractive index dispersion and extinction coefficients have been calculated. Laser induced damage threshold (LIDT) measurement shows that despite slight differences between the extinction coefficients of the two samples, the LIDT parameter of the ZrO2 film is greater than that of the TiO2 film. This fact leads us to consider thermal conductivity as an important parameter for interpreting the LIDT difference. According to our theoretical analysis, as a consequence of increase in the number of thermal barriers along poorer film, its thermal conductivity, and hence LIDT, decreased, which is in agreement with our experimental results. The measured porosity of the two samples shows higher porosity for TiO2 single layer, which is in agreement with atomic force (AFM) images. The gradual and smooth damage morphology of ZrO2 observed in optical images implies higher thermal conductivity than TiO2. (C) 2010 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1187 / 1192
页数:6
相关论文
共 50 条
  • [31] Effect of porosity on the laser induced damage threshold of porous anodic alumina films
    Wu, Shigang
    Zhang, Hongying
    Wang, Hu
    Xia, Zhi Lin
    OPTIK, 2013, 124 (18): : 3246 - 3249
  • [32] Preparation of sol-gel ZrO2 films with high laser-induced damage threshold under high temperature
    Zhu, Yongqiao
    Ma, Ming
    Zhang, Pu
    Cai, Wenzhe
    Li, Dawei
    Xu, Cheng
    OPTICS EXPRESS, 2019, 27 (26) : 37568 - 37578
  • [33] Low-temperature synthesis and characterization of TiO2 and TiO2–ZrO2 photocatalytically active thin films
    Ksenija Maver
    Urška Lavrenčič Štangar
    Urh Černigoj
    Silvia Gross
    Romana Cerc Korošec
    Photochemical & Photobiological Sciences, 2009, 8 : 657 - 662
  • [34] Temperature effect on the nanosecond laser-induced damage of TiO2 films with two additives
    Ma, Ming
    Xu, Cheng
    Lin, Di
    Sun, Huanhuan
    Lin, Enzhu
    Feng, Peizhong
    Qiang, Yinghuai
    Li, Dawei
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2017, 19 (3-4): : 189 - 196
  • [35] Investigation on the Effect of Withdrawal Speed on Laser Induced Damage Performance of TiO2 Thin Films
    Imene Hind Laouamri
    Kouider Kebabi
    undefined Ferria
    Glass Physics and Chemistry, 2024, 50 (6) : 668 - 673
  • [36] Sol-gel processing of ZrO2 and polymer doped-ZrO2 monolayer reflective films with high laser damage threshold
    Liang Li-Ping
    Xu Yao
    Zhang Lei
    Wu Dong
    Sun Yu-Han
    Li Zhi-Hong
    Wu Zhong-Hua
    ACTA PHYSICA SINICA, 2006, 55 (08) : 4371 - 4382
  • [37] CRYSTALLIZATION OF GLASSES ACTIVATED WITH TIO2 OR ZRO2
    ALEKSEEVA, IP
    BELYAEVSKAYA, NM
    BOBOVICH, YS
    TSENTER, MY
    CHUVAEVA, TI
    INORGANIC MATERIALS, 1980, 16 (09) : 1084 - 1088
  • [38] Study of laser created ZRO2 and hydroxyapatite/ZrO2 films for implantology
    Jelinek, A.
    Dostalova, T.
    Teuberova, Z.
    Seydlova, A.
    Masinova, P.
    Kocourek, T.
    Mroz, W.
    Prokopiuk, A.
    Smetana, K.
    BIOMOLECULAR ENGINEERING, 2007, 24 (01): : 103 - 106
  • [39] ZrO2/TiO2 films prepared by plasma electrolytic oxidation and a post treatment
    Yan, Zongcheng
    Wu, Mingyue
    Qin, Honglei
    He, Yongyi
    Yu, Xiwen
    Chen, Li
    SURFACE & COATINGS TECHNOLOGY, 2017, 309 : 331 - 336
  • [40] Neo-pentoxide precursors for MOCVD thin films of TiO2 and ZrO2
    Gallegos, JJ
    Ward, TL
    Boyle, TJ
    Rodriguez, MA
    Francisco, LP
    CHEMICAL VAPOR DEPOSITION, 2000, 6 (01) : 21 - 26