Compact Modeling of SOI-LDMOS Including Quasi-Saturation Effect

This paper presents a physics-based compact de model for high voltage silicon on insulator lateral double diffused MOS (SOI-LDMOS) transistor, assuming uniform doping for the channel. It uses MM20 model for the channel and drift region under the thin gate oxide, and proposes a new model for the drift region under the field oxide. This model shows that the current at higher gate voltages in SOI-LDMOS, is limited by the velocity saturation in the drift region under the field oxide, which determines the device behavior in the quasi-saturation region. The model exhibits high level of accuracy over wide bias ranges.