Hot-Wire Chemical Vapour Deposition for Silicon Nitride Waveguides

被引：1

作者：

Bucio, T. Dominguez ^{[1
]}

Tarazona, A. ^{[1
]}

Khokhar, A. Z. ^{[1
]}

Mashanovich, G. Z. ^{[1
]}

Gardes, F. Y. ^{[1
]}

机构：

[1] Univ Southampton, Optoelect Res Ctr, Highfield Campus, Southampton SO17 1BJ, Hants, England

来源：

SILICON COMPATIBLE MATERIALS, PROCESSES, AND TECHNOLOGIES FOR ADVANCED INTEGRATED CIRCUITS AND EMERGING APPLICATIONS 6 | 2016年 / 72卷 / 04期

基金：

英国工程与自然科学研究理事会;

关键词：

D O I：

10.1149/07204.0269ecst

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

In this work, we demonstrate the use of hot-wire chemical vapour deposition (HWCVD) as an alternative technique to grow SiN layers for photonic waveguides at temperatures <400 degrees C. In particular, the effect of the ammonia flow and the filament temperature on the material structure, optical properties and propagation losses of the deposited films was investigated. SiN layers with good thickness uniformity, roughness as low as 0.61nm and H concentration as low as 10.4x10 21 atoms/cm(3) were obtained. Waveguides fabricated on the studied materials exhibited losses as low as 7.1 and 12.3 dB/cm at 1310 and 1550nm respectively.

引用

页码：269 / 272

页数：4

共 50 条

[21] Doped zinc oxide films grown by hot-wire chemical vapour deposition
Abrutis, A.
Silimavicius, L.
Kubilius, V.
Murauskas, T.
Saltyte, Z.
Plausinaitiene, V.
THIN SOLID FILMS, 2015, 576 : 88 - 97
[22] High hydrogen content silicon nitride for photovoltaic applications deposited by Hot-Wire chemical vapor deposition
Holt, JK
Swiatek, M
Goodwin, DG
Atwater, HA
AMORPHOUS AND HETEROGENEOUS SILICON-BASED FILMS-2002, 2002, 715 : 485 - 490
[23] Hot-wire polysilicon waveguides with low deposition temperature
Ben Masaud, Taha M.
Tarazona, Antulio
Jaberansary, Ehsan
Chen, Xia
Reed, Graham T.
Mashanovich, Goran Z.
Chong, H. M. H.
OPTICS LETTERS, 2013, 38 (20) : 4030 - 4032
[24] A numerical model for hot-wire chemical vapor deposition of amorphous silicon
Goodwin, DG
AMORPHOUS AND HETEROGENEOUS SILICON THIN FILMS: FUNDAMENTALS TO DEVICES-1999, 1999, 557 : 79 - 84
[25] Hot-wire chemical vapor deposition of silicon nanoparticles on fused silica
Salivati, Navneethakrishnan
An, Yong Q.
Downer, Michael C.
Ekerdt, John G.
THIN SOLID FILMS, 2009, 517 (12) : 3481 - 3483
[26] Fabrication of amorphous carbon nitride films by hot-wire chemical vapor deposition
Yokomichi, H
Masuda, A
Kishimoto, N
THIN SOLID FILMS, 2001, 395 (1-2) : 249 - 252
[27] Low-temperature growth of graphene nanoplatelets by hot-wire chemical vapour deposition
Anuar, Nur Afira binti
Nor, Nurul Hidayah Mohamad
Awang, Rozidawati binti
Nakajima, Hideki
Tunmee, Sarayut
Tripathi, Manoj
Dalton, Alan
Goh, Boon Tong
SURFACE & COATINGS TECHNOLOGY, 2021, 411
[28] Hydrogen at compact sites in hot-wire chemical vapour deposited polycrystalline silicon films
Rath, JK
Schropp, REI
Beyer, W
JOURNAL OF NON-CRYSTALLINE SOLIDS, 2000, 266 : 190 - 194
[29] Very thin amorphous and microcrystal line silicon films deposited by hot-wire chemical vapour deposition for photovoltaic applications
Weber, U
Mukherjee, C
Kupich, M
Schröder, B
POLYCRYSTALLINE SEMICONDUCTORS VII, PROCEEDINGS, 2003, 93 : 87 - 98
[30] Profiled poly-silicon films by Hot-Wire Chemical Vapour Deposition for solar cells on cheap metal substrate
Rath, JK
Tichelaar, FD
Schropp, REI
SOLID STATE PHENOMENA, 1999, 67-8 : 465 - 470

← 1 2 3 4 5 →