Optical net gain measurement in n-type doped germanium waveguides under optical pumping for silicon monolithic laser

被引:8
|
作者
Okumura, Tadashi [1 ]
Oda, Katsuya [1 ]
Kasai, Junichi [1 ]
Sagawa, Misuzu [2 ]
Suwa, Yuji [1 ]
机构
[1] Hitachi Ltd, Ctr Exploratory Res, 1-280 Higashi Koigakubo, Kokubunji, Tokyo 1858601, Japan
[2] Hitachi Ltd, Ctr Technol Innovat Elect, 1-280 Higashi Koigakubo, Kokubunji, Tokyo 1858601, Japan
来源
OPTICS EXPRESS | 2016年 / 24卷 / 09期
关键词
GE; ABSORPTION; SI;
D O I
10.1364/OE.24.009132
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Silicon (Si) monolithic lasers are key devices in large-scale, high-density photonic integrated circuits. Germanium (Ge) is promising as an active layer due to the complementary metal-oxide semiconductor process compatibility with Si. A net optical gain from Ge is essential to demonstrate lasing operation. We fabricated Ge waveguides and investigated the n-type doping effect on the net optical gain. The estimated net gain of the n-Ge waveguide increased from -2200 to -500/cm, namely reducing loss, under optically pumped condition. (C) 2016 Optical Society of America
引用
收藏
页码:9132 / 9139
页数:8
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