Efficiency of body biasing in 90 nm CMOS for low power digital circuits

被引:10
|
作者
von Arnim, K [1 ]
Borinski, E [1 ]
Seegebrecht, P [1 ]
Fiedler, H [1 ]
Brederlow, R [1 ]
Thewes, R [1 ]
Berthold, J [1 ]
Pacha, C [1 ]
机构
[1] Infineon Technol, Corp Res, D-81730 Munich, Germany
关键词
D O I
10.1109/ESSCIR.2004.1356646
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents an evaluation of body biasing based on measured static and dynamic device performance. The efficiency of body biasing in sub-130 nm CMOS circuits strongly depends on the device type and operating temperature. While forward biasing still provides a significant performance gain in a 90 nm CMOS triple well process, the efficiency of reverse biasing nearly vanishes. The impact of the zero temperature coefficient point on low voltage digital circuit design is investigated.
引用
收藏
页码:175 / 178
页数:4
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