Relationship between capacitance and conductance in MOS capacitors

被引:0
|
作者
Caruso, E. [1 ]
Lin, J. [1 ]
Monaghan, S. [1 ]
Cherkaoui, K. [1 ]
Floyd, L. [1 ]
Gity, F. [1 ]
Palestri, P. [2 ]
Esseni, D. [2 ]
Selmi, L. [3 ]
Hurley, P. K. [1 ]
机构
[1] Univ Coll Cork, Tyndall Natl Inst, Cork, Ireland
[2] Univ Udine, DPIA, Via Sci 206, I-33100 Udine, Italy
[3] Univ Modena & Reggio Emilia, DIEF, Via P Vivarelli 10-1, I-41125 Modena, Italy
基金
爱尔兰科学基金会; 欧盟地平线“2020”;
关键词
Characterization; extraction technique; MOS; multi-frequency; C-V; G-V; minority carrier lifetime; oxide capacitance; doping;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, we describe how the frequency dependence of conductance (G) and capacitance (C) of a generic MOS capacitor results in peaks of the functions G/omega and - omega dC/d omega. By means of TCAD simulations, we show that G/omega and -omega dC/d omega peak at the same value and at the same frequency for every bias point from accumulation to inversion. We illustrate how the properties of the peaks change with the semiconductor doping (N-D), oxide capacitance (C-OX), minority carrier lifetime (tau(g)), interface defect parameters (N-IT, sigma) and majority carrier dielectric relaxation time (tau(r)). Finally, we demonstrate how these insights on G/omega and -omega dC/d omega can be used to extract C-OX, N-D and tau(g) from InGaAs MOSCAP measurements
引用
收藏
页码:315 / 318
页数:4
相关论文
共 50 条
  • [31] On the evaluation of the capacitance of bispherical capacitors
    Gongora, A
    LeyKoo, E
    REVISTA MEXICANA DE FISICA, 1996, 42 (04) : 663 - 674
  • [32] Direct observation of inversion capacitance in p-type diamond MOS capacitors with an electron injection layer
    Matsumoto, Tsubasa
    Kato, Hiromitsu
    Makino, Toshiharu
    Ogura, Masahiko
    Takeuchi, Daisuke
    Yamasaki, Satoshi
    Imura, Masataka
    Ueda, Akihiro
    Inokuma, Takao
    Tokuda, Norio
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2018, 57 (04)
  • [33] Pulsed Capacitance-Voltage Measurements on Al2O3-based MOS Capacitors
    Sambuco Salomone, L.
    Lipovetzky, J.
    Carbonetto, S. H.
    Garcia-Inza, M. A.
    Redin, E. G.
    Campabadal, F.
    Faigon, A.
    PROCEEDINGS OF THE 2014 ARGENTINE SCHOOL OF MICRO-NANOELECTRONICS, TECHNOLOGY AND APPLICATIONS (EAMTA), 2014, : 54 - 58
  • [34] Problem of capacitance comparison for capacitors
    Shiraishi, Soshi
    Electrochemistry, 2004, 72 (08) : 598 - 600
  • [35] Direct observation of inversion capacitance in p-type diamond MOS capacitors with an electron injection layer
    Matsumoto, Tsubasa
    Kato, Hiromitsu
    Makino, Toshiharu
    Ogura, Masahiko
    Takeuchi, Daisuke
    Yamasaki, Satoshi
    Imura, Masataka
    Ueda, Akihiro
    Inokuma, Takao
    Tokuda, Norio
    Japanese Journal of Applied Physics, 2018, 57 (04):
  • [36] Photonic characterization of capacitance-voltage characteristics in MOS capacitors and current-voltage characteristics in MOSFETs
    Kim, HC
    Kim, HT
    Cho, SD
    Song, SJ
    Kim, YC
    Kim, SK
    Chi, SS
    Kim, DJ
    Kim, DM
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2002, 40 (01) : 64 - 67
  • [37] Capacitance-voltage measurements of monolayer MoS2 metal-oxide-semiconductor capacitors
    Yang, Hae In
    Choi, Woong
    MICROELECTRONIC ENGINEERING, 2021, 238
  • [38] Analysis of fast and slow responses in AC conductance curves for p-type SiC MOS capacitors
    Karamoto, Yuki
    Zhang, Xufang
    Okamoto, Dai
    Sometani, Mitsuru
    Hatakeyama, Tetsuo
    Harada, Shinsuke
    Iwamuro, Noriyuki
    Yano, Hiroshi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2018, 57 (06)
  • [39] A comparative study on capacitance and conductance-voltage response of titanium dioxide based MOS hydrogen sensor
    Dwivedi, D
    Dwivedi, R
    Srivastava, SK
    SOLID STATE PHENOMENA, 1997, 55 : 113 - 116
  • [40] Comparative study on capacitance and conductance-voltage response of titanium dioxide based MOS hydrogen sensor
    Banaras Hindu Univ, Varanasi, India
    Diffusion and Defect Data Pt.B: Solid State Phenomena, 1997, 55 : 113 - 116