MEMS technology - Evaluating the use of hard-mask films during bulk silicon etching

被引：0
|
作者：
Goldman, K [1 ]
Sooriakumar, K
Ray, C
Schade, M
机构：
[1] Motorola Inc, Micromachining Dev Grp, Sensor Prod Div, Phoenix, AZ 85008 USA
[2] Motorola Inc, Chem & Surface Anal Lab, Phoenix, AZ USA
来源：
MICRO | 1997年 / 15卷 / 03期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：67 / +
页数：5
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