Sputtering-assisted metal-organic chemical vapor deposition of Yb-doped ZnO for photonic conversion in Si solar cells

被引:7
|
作者
Okada, Ryutaro [1 ]
Miao, Wei [1 ]
Terai, Yoshikazu [1 ]
Tsuji, Takahiro [1 ]
Fujiwara, Yasufumi [1 ]
机构
[1] Osaka Univ, Grad Sch Engn, Div Mat & Mfg Sci, Suita, Osaka 5650871, Japan
关键词
Yb3+; ZnO; photoluminescence; CVD; THIN-FILMS; EMISSION; TM;
D O I
10.1002/pssc.201300614
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have grown Yb-doped ZnO (ZnO:Yb) on c-plane sapphire substrates by sputtering-assisted metal-organic chemical vapor deposition (SA-MOCVD). X-ray diffraction (XRD) revealed that these ZnO:Yb films exhibit a c-axis orientation and that the lattice constant increases with Yb concentration. After annealing the samples at 600 degrees C for 0.5 h in O2, they showed a clear 980 nm emission due to the intra-4f shell transitions of F-2(5/2) -F-2(7/2) in Yb3+ ions. It turns out that Yb lu-minescent centers with different local structures coexist, which exhibit different energy transfer processes from the ZnO host. (C) 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
引用
收藏
页码:1292 / 1295
页数:4
相关论文
共 50 条
  • [31] Room temperature electroluminescence from ZnO/Si heterojunction devices grown by metal-organic chemical vapor deposition
    Li, Xiangping
    Zhang, Baolin
    Dong, Xin
    Zhang, Yuantao
    Xia, Xiaochuan
    Zhao, Wang
    Du, Guotong
    JOURNAL OF LUMINESCENCE, 2009, 129 (01) : 86 - 89
  • [32] Hydroxyl-radical-assisted growth of ZnO films by remote plasma metal-organic chemical vapor deposition
    Nakamura, A. (atsushi@nvrc.rie.shizuoka.ac.jp), 1600, Japan Society of Applied Physics (43):
  • [33] Hydroxyl-radical-assisted growth of ZnO films by remote plasma metal-organic chemical vapor deposition
    Nakamura, A
    Shigemori, S
    Shimizu, Y
    Aoki, T
    Temmyo, J
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (11A): : 7672 - 7676
  • [34] Preparation of Ga-Doped ZnO Thin Films by Metal-Organic Chemical Vapor Deposition with Ultrasonic Nebulization
    Lee, Choon-Ho
    Oh, Seong-Hoon
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2016, 16 (11) : 11552 - 11557
  • [35] Investigation of arsenic-doped ZnO thin films grown on Si substrate by atmospheric-pressure metal-organic chemical vapor deposition
    Hung, S. C.
    Wang, K. J.
    Lan, S. M.
    Yang, T. N.
    Uen, W. Y.
    Chi, G. C.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2012, 209 (06): : 1053 - 1058
  • [36] Laser-Assisted Metal-Organic Chemical Vapor Deposition of Gallium Nitride
    Zhang, Yuxuan
    Chen, Zhaoying
    Zhang, Kaitian
    Feng, Zixuan
    Zhao, Hongping
    PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2021, 15 (06):
  • [37] Numerical simulation and study of the metal-organic chemical vapor deposition growth of ZnO film
    Li, Jian
    Cai, Jiandong
    Wu, Ziling
    Wang, Jie
    Pei, Yanli
    Wang, Gang
    PHYSICS OF FLUIDS, 2019, 31 (02)
  • [38] High efficiency GaAs/Si monolithic three-terminal cascade solar cells grown by metal-organic chemical vapor deposition
    Yang, Mingju
    Soga, Tetsuo
    Egawa, Takashi
    Jimbo, Takashi
    Umeno, Masayoshi
    Japanese Journal of Applied Physics, Part 2: Letters, 1994, 33 (5 B):
  • [39] Effect of growth temperature on the characteristics of ZnO films grown on Si(111) substrates by metal-organic chemical vapor deposition
    Zhu, Junjie
    Yao, Ran
    Song, Haiyan
    Fu, Zhuxi
    Kuznetsov, A. Yu.
    Lee, In-Hwan
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2008, 26 (02): : 224 - 227
  • [40] NH3-assisted growth approach for ZnO films by atmospheric pressure metal-organic chemical vapor deposition
    Dai, Jiangnan
    Jiang, Fengyi
    Pu, Yong
    Wang, Li
    Fang, Wenqing
    Li, Fan
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2007, 89 (03): : 645 - 650