XPS, impedance and photd-electrochemical characterisation of passive films on Ni and Ni-18Cr alloy in sulphuric acid solution

被引：0

作者：

Fujimoto, S ^{[1
]}

Tsuchiya, H ^{[1
]}

Sakamoto, M ^{[1
]}

Shibata, T ^{[1
]}

Asami, K ^{[1
]}

机构：

[1] Osaka Univ, Grad Sch Engn, Dept Mat Sci & Engn, Aoba Ku, Suita, Osaka 5650871, Japan

来源：

CORROSION SCIENCE: A RETROSPECTIVE AND CURRENT STATUS IN HONOR OF ROBERT P FRANKENTHAL | 2002年 / 2002卷 / 13期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

A brief history is described for the photo electrochemical characterisation of passive film. Properties of passive films on Ni and Ni-18Cr formed in acid solution are characterised in order to discuss semiconductor properties of passive films. Materials were polarised in deaerated 0.1 kmol m(-3) H2SO4 at various potentials for up to 24 hours. Photocurrent generated by irradiation of monochromated light, and capacitance by means of electrochemical impedance, were measured for a series of potentials in less noble direction from the film formation potential. The passive films were also characterised using XPS.

引用

页码：198 / 208

页数：11

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