XPS, impedance and photd-electrochemical characterisation of passive films on Ni and Ni-18Cr alloy in sulphuric acid solution

被引:0
|
作者
Fujimoto, S [1 ]
Tsuchiya, H [1 ]
Sakamoto, M [1 ]
Shibata, T [1 ]
Asami, K [1 ]
机构
[1] Osaka Univ, Grad Sch Engn, Dept Mat Sci & Engn, Aoba Ku, Suita, Osaka 5650871, Japan
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中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
A brief history is described for the photo electrochemical characterisation of passive film. Properties of passive films on Ni and Ni-18Cr formed in acid solution are characterised in order to discuss semiconductor properties of passive films. Materials were polarised in deaerated 0.1 kmol m(-3) H2SO4 at various potentials for up to 24 hours. Photocurrent generated by irradiation of monochromated light, and capacitance by means of electrochemical impedance, were measured for a series of potentials in less noble direction from the film formation potential. The passive films were also characterised using XPS.
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页码:198 / 208
页数:11
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