Improvement in electrostatic effeciency using workfunction modulated dual metal gate FinFET

被引:7
|
作者
Daga, Mitali [1 ]
Mishra, Guru Prasad [1 ]
机构
[1] Natl Inst Technol Raipur, Dept Elect & Commun, Raipur, Madhya Pradesh, India
关键词
Mole fraction; Dual-metal; Subthreshold; Convergence; Electrrostatic efficiency; Scalability; WORK-FUNCTION MODULATION;
D O I
10.1016/j.matpr.2020.09.082
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper demonstrates a 3-D simulation study of a workfunction modulated dual material gate FinFET (WMDMGF). The source side gate material workfunction of a dual material gate FinFET is modulated linearly keeping drain side material workfunction to be constant. This model provides improvement in terms of DC performance such as better drive current and minimum threshold voltage. Thus, enhancing the switching characteristics of the device and providing better speed. The model is simulated using Silvaco TCAD tool, and the results are compared with single metal gate and dual metal gate FinFET performance. ? 2020 Elsevier Ltd. All rights reserved. Selection and peer-review under responsibility of the scientific committee of the International Conference on Nanoelectronics, Nanophotonics, Nanomaterials, Nanobioscience & Nanotechnology.
引用
收藏
页码:3443 / 3446
页数:4
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