Advanced technology steps in the fabrication of GaAs microstrip detectors

被引：0

作者：

Albertz, D ^{[1
]}

Braunschweig, W ^{[1
]}

Karpinski, W ^{[1
]}

Krais, R ^{[1
]}

Kubicki, T ^{[1
]}

Lubelsmeyer, K ^{[1
]}

Rente, C ^{[1
]}

Syben, O ^{[1
]}

Tenbusch, F ^{[1
]}

Toporowski, M ^{[1
]}

Wittmer, B ^{[1
]}

Xiao, WJ ^{[1
]}

机构：

[1] Rhein Westfal TH Aachen, Inst Phys 1, D-52056 Aachen, Germany

来源：

NUCLEAR PHYSICS B | 1998年

关键词：

D O I：

10.1016/S0920-5632(97)00599-9

中图分类号：

O412 [相对论、场论]; O572.2 [粒子物理学];

学科分类号：

摘要：

We report on the fabrication of Ga-As microstrip detectors with integrated coupling capacitors and biasing resistors. The characteristics of the dielectrica SiO2 and Si3N4 are compared. The SiO2 layers were fabricated by Evaporation. The Si3N4 layers were grown by plasma enhanced vapour deposition. The IV-properties and the yield of the devices is investigated. First results of ion implanted back side contacts without an annealing step are presented.

引用

页码：438 / 441

页数：4

共 50 条

[31] Performances of SI GaAs detectors fabricated with a new technology.
Nava, F
Alietti, M
Canali, C
Cavallini, A
delPapa, C
Re, V
Lanzieri, C
1995 IEEE NUCLEAR SCIENCE SYMPOSIUM AND MEDICAL IMAGING CONFERENCE RECORD, VOLS 1-3, 1996, : 380 - 384
[32] Silicon microstrip detectors
Montano, Luis M.
Particles and Fields, Pt A, 2006, 857 : 143 - 151
[33] P-spray implant optimization for the fabrication of n-in-p microstrip detectors
Fleta, Celeste
Lozano, Manuel
Pellegrini, Giulio
Campabadal, Francesca
Rafi, Joan Marc
Ullan, Miguel
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2007, 573 (1-2): : 8 - 11
[34] PIRE: A GLOBAL CONSORTIUM FOR ADVANCED GERMANIUM DETECTORS AND TECHNOLOGY
Mei, Dongming
PROCEEDINGS OF THE SOUTH DAKOTA ACADEMY OF SCIENCE, VOL 94, 2015, 94 : 352 - 352
[35] BEAM TEST-RESULTS ON SI AND GAAS MICROSTRIP DETECTORS WITH LENGTH UP TO 64 CM
BRAUNSCHWEIG, W
SYBEN, O
TOPOROWSKY, M
TENBUSCH, F
WITTMER, B
ADRIANI, O
BALBONI, C
CASTELLINI, G
ANTICIC, T
CHIEN, CY
PEVSNER, A
SPANGLER, W
CHANG, YH
CHEN, AE
HOU, SR
HUANG, KT
LIN, WT
ALPAT, B
BATTISTON, R
FIANDRINI, E
GINGU, C
IONICA, M
LARICIA, P
TOKER, O
LAURIKAINEN, P
ORAVA, R
OSTONEN, R
SPATIOTIS, K
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1995, 366 (2-3): : 236 - 247
[36] ADVANCED FABRICATION TECHNOLOGY AT THE SPRINGFIELDS LABORATORY.
Anon
Welding and Metal Fabrication, 1988, 56 (03): : 143 - 144
[37] FABRICATION OF MICROSTRIP PATCH ANTENNA USING NOVEL HYBRID PRINTING TECHNOLOGY
Shah, Syed Imran Hussain
Lee, Dongju
Tentzeris, Manos M.
Lim, Sungjoon
MICROWAVE AND OPTICAL TECHNOLOGY LETTERS, 2016, 58 (11) : 2602 - 2606
[38] OPTICAL-DETECTORS FOR GAAS MMIC INTEGRATION - TECHNOLOGY-ASSESSMENT
CLASPY, PC
BHASIN, KB
OPTICAL TECHNOLOGY FOR MICROWAVE APPLICATIONS IV, 1989, 1102 : 53 - 60
[39] LOSSES IN GAAS MICROSTRIP
GOLDFARB, ME
PLATZKER, A
IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 1990, 38 (12) : 1957 - 1963
[40] Progressive steps in the platform science and technology for advanced magnesium alloys
Kojima, Y
Aizawa, T
Kamado, S
Higashi, K
MAGNESIUM ALLOYS 2003, PTS 1 AND 2, 2003, 419-4 : 3 - 20

← 1 2 3 4 5 →