We demonstrated the two-dimensional characterization of p(+)-Si/n(-)-SiC heterointerfaces by scanning internal photoemission microscopy (SIPM). In internal photoemission spectra, a linear relationship was found between the square root of photoyield (Y) and photon energy, and the threshold energy (qV(th)) was reasonably obtained to be 1.34 eV. From the SIPM results, Y and qV(th) maps were successfully obtained, and nanometer-deep gaps in the junction were sensitively visualized as a pattern. These results suggest that this method is a powerful tool for investigating the inhomogeneity of heterojunctions as well as their carrier transport properties. (C) 2016 The Japan Society of Applied Physics