Cr/Sc multilayers for the soft-x-ray range

被引：65
|
作者：
Schafers, F
Mertins, HC
Schmolla, F
Packe, I
Salashchenko, NN
Shamov, EA
机构：
[1] BESSY MBH, D-14195 Berlin, Germany
[2] Russian Acad Sci, Inst Phys Microstruct, Nizhnii Novgorod 603600, Russia
来源：
APPLIED OPTICS | 1998年 / 37卷 / 04期
关键词：
D O I：
10.1364/AO.37.000719
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We have systematically investigated ultrathin Cr/Sc multilayers (nanolayers), using tunable soft-x-ray synchrotron radiation. The multilayers were optimized for use either in normal incidence or at 45 degrees at photon energies around the 2p-absorption edges of Sc (399 eV) and Cr (574 eV), respectively. They were sputter deposited on Si wafers or on thin Si3N4-membrane support structures for use in reflection and in transmission, respectively, as polarizing and phase-retarding elements in a polarimeter. The performance theoretically expected with respect to reflection/transmission and energy resolution has been confirmed experimentally: A value of 7% for the normal-incidence peak reflectance at 395 eV was measured as well as a pronounced minimum in transmission for certain incidence angles and energies below the respective absorption edges, indicating significant phase-shifting effects. (C) 1998 Optical Society of America.
引用
收藏
页码：719 / 728
页数：10
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