Ordered Silica Nanostructure by the Calcination of Block Copolymer with Polyhedral Oligomeric Silsesquioxane (POSS) Side Chain

被引：8
|
作者：
Iwao, Sota [1 ,2 ]
Kurono, Naoki [1 ,2 ]
Higashiguchi, Wataru [1 ,2 ]
Hayakawa, Teruaki [3 ]
Ohta, Noboru [4 ]
Kamitani, Kazutaka [5 ]
Fujii, Syuji [1 ,2 ]
Nakamura, Yoshinobu [1 ,2 ]
Hirai, Tomoyasu [1 ,2 ]
机构：
[1] Osaka Inst Technol, Dept Appl Chem, Fac Engn, Asahi Ku, 5-16-1 Omiya, Osaka 5358585, Japan
[2] Osaka Inst Technol, Grad Sch Engn, Asahi Ku, 5-16-1 Omiya, Osaka 5358585, Japan
[3] Tokyo Inst Technol, Dept Mat Sci & Engn, Sch Mat & Chem Technol, Meguro Ku, 2-12-1-S8-36 Ookayama, Tokyo 1528552, Japan
[4] SPring 8, Japan Synchrotron Radiat Res Inst, Sayo, Hyogo 6795198, Japan
[5] Aichi Sci & Technl Foudat, Aichi Synchrotron Radiat Ctr, 250-3 Minamiyamaguchi Cho, Seto, Aichi 4890965, Japan
来源：
CHEMISTRY LETTERS | 2022年 / 51卷 / 07期
关键词：
Polyhedral oligomeric silsesquioxane (POSS); Block copolymer; Living anionic polymerization;
D O I：
10.1246/cl.220180
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Silica with well-ordered line patterns and a periodicity of approximately 30 nm was prepared by the calcination of a block copolymer with polyhedral oligomeric silsesquioxane (POSS) as a template. A POSS-containing block copolymer was prepared via living anionic polymerization. The thin film of the block copolymer exhibited linear features upon CS2 vapor annealing. Cylindrical structure changed to a line morphology during calcination process.
引用
收藏
页码：781 / 783
页数：3
相关论文
共 50 条
  • [31] Synthesis and photopolymerization of UV curable polyhedral oligomeric silsesquioxane (POSS).
    Pan, B
    Hoyle, CE
    Lichtenhan, J
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 228 : U389 - U389
  • [32] Electrospun PMMA/polyhedral oligomeric silsesquioxane (POSS) nanohybrid nanofibers
    Kang, Soon-Gon
    Bae, Yo-Han
    Quan, Shi-Li
    Chin, In-Joo
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2009, 238
  • [33] Hansen solubility parameters of polyhedral oligomeric silsesquioxane (POSS) compounds
    Guenthner, Andrew J.
    Lamison, Kevin R.
    Lubin, Lisa M.
    Mabry, Joseph M.
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2012, 243
  • [34] Nanoscale reinforcement of polyhedral oligomeric silsesquioxane (POSS) in polyurethane elastomer
    Hsiao, BS
    White, H
    Rafailovich, M
    Mather, PT
    Jeon, HG
    Phillips, S
    Lichtenhan, J
    Schwab, J
    POLYMER INTERNATIONAL, 2000, 49 (05) : 437 - 440
  • [35] METHACRYLATE FUNCTIONALIZED POLYHEDRAL OLIGOMERIC SILSESQUIOXANE (POSS) MONOMERS AND POLYMERS
    LICHTENHAN, JD
    OTONARI, YA
    CARR, MJ
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 129 - POLY
  • [36] Thermal property of polyhedral oligomeric silsesquioxane (POSS)/polystyrene composites
    Song, Xiaoyan
    Cheng, Bowen
    Fuhe Cailiao Xuebao/Acta Materiae Compositae Sinica, 2010, 27 (05): : 29 - 35
  • [37] Functionalization of Polyhedral Oligomeric Silsesquioxane (POSS) via Nucleophilic Substitution
    Dutkiewicz, Michal
    Maciejewski, Hieronim
    Marciniec, Bogdan
    SYNTHESIS-STUTTGART, 2009, (12): : 2019 - 2024
  • [38] Bridged polyhedral oligomeric silsesquioxane(POSS):A potential member of silsesquioxanes
    Jian Kun Hu
    Chinese Chemical Letters, 2012, 23 (02) : 181 - 184
  • [39] The effect of thermal treatment on the decomposition of phthalonitrile polymer and phthalonitrile-polyhedral oligomeric silsesquioxane (POSS) copolymer
    Li, Xiaodan
    Wang, Jian
    Sun, Yuanjun
    Zhang, Dongxing
    Zhu, Nan
    Jing, Lei
    POLYMER DEGRADATION AND STABILITY, 2018, 156 : 279 - 291
  • [40] Physical gelation in ethylene-propylene copolymer melts induced by polyhedral oligomeric silsesquioxane (POSS) molecules
    Fu, BX
    Gelfer, MY
    Hsiao, BS
    Phillips, S
    Viers, B
    Blanski, R
    Ruth, P
    POLYMER, 2003, 44 (05) : 1499 - 1506
12345