Ordered Silica Nanostructure by the Calcination of Block Copolymer with Polyhedral Oligomeric Silsesquioxane (POSS) Side Chain

被引：8
|
作者：
Iwao, Sota [1 ,2 ]
Kurono, Naoki [1 ,2 ]
Higashiguchi, Wataru [1 ,2 ]
Hayakawa, Teruaki [3 ]
Ohta, Noboru [4 ]
Kamitani, Kazutaka [5 ]
Fujii, Syuji [1 ,2 ]
Nakamura, Yoshinobu [1 ,2 ]
Hirai, Tomoyasu [1 ,2 ]
机构：
[1] Osaka Inst Technol, Dept Appl Chem, Fac Engn, Asahi Ku, 5-16-1 Omiya, Osaka 5358585, Japan
[2] Osaka Inst Technol, Grad Sch Engn, Asahi Ku, 5-16-1 Omiya, Osaka 5358585, Japan
[3] Tokyo Inst Technol, Dept Mat Sci & Engn, Sch Mat & Chem Technol, Meguro Ku, 2-12-1-S8-36 Ookayama, Tokyo 1528552, Japan
[4] SPring 8, Japan Synchrotron Radiat Res Inst, Sayo, Hyogo 6795198, Japan
[5] Aichi Sci & Technl Foudat, Aichi Synchrotron Radiat Ctr, 250-3 Minamiyamaguchi Cho, Seto, Aichi 4890965, Japan
来源：
CHEMISTRY LETTERS | 2022年 / 51卷 / 07期
关键词：
Polyhedral oligomeric silsesquioxane (POSS); Block copolymer; Living anionic polymerization;
D O I：
10.1246/cl.220180
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Silica with well-ordered line patterns and a periodicity of approximately 30 nm was prepared by the calcination of a block copolymer with polyhedral oligomeric silsesquioxane (POSS) as a template. A POSS-containing block copolymer was prepared via living anionic polymerization. The thin film of the block copolymer exhibited linear features upon CS2 vapor annealing. Cylindrical structure changed to a line morphology during calcination process.
引用
收藏
页码：781 / 783
页数：3
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