Tunable electrical and optical properties of hafnium nitride thin films

被引：27

作者：

Farrell, I. L. ^{[1
]}

Reeves, R. J. ^{[1
]}

Preston, A. R. H. ^{[2
]}

Ludbrook, B. M. ^{[2
]}

Downes, J. E. ^{[3
]}

Ruck, B. J. ^{[2
]}

Durbin, S. M. ^{[4
]}

机构：

[1] Univ Canterbury, Dept Phys & Astron, Christchurch 8140, New Zealand

[2] Victoria Univ, Sch Chem & Phys Sci, Wellington 6140, New Zealand

[3] Macquarie Univ, Dept Phys & Engn, N Ryde, NSW 2109, Australia

[4] Univ Canterbury, Dept Elect & Comp Engn, Christchurch 8140, New Zealand

来源：

APPLIED PHYSICS LETTERS | 2010年 / 96卷 / 07期

关键词：

band structure; hafnium compounds; plasma materials processing; pulsed laser deposition; thin films; X-ray absorption spectra; LAYERS;

D O I：

10.1063/1.3327329

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report structural and electronic properties of epitaxial hafnium nitride films grown on MgO by plasma-assisted pulsed laser deposition. The electronic structure measured using soft x-ray absorption and emission spectroscopy is in excellent agreement with the results of a band structure calculation. We show that by varying the growth conditions we can extend the films' reflectance further toward the UV, and we relate this observation to the electronic structure.

引用

页数：3

共 50 条

[41] Optical properties of unoxidized and oxidized titanium nitride thin films
Odusanya, Abiodun A.
Schall, J. David
Pfeifer, Mark A.
Wright, John
Martin, Catalin
Craciun, Valentin
Kumar, Dhananjay
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ENGINEERING, 2025, 20 (01):
[42] OPTICAL-PROPERTIES OF THIN-FILMS OF ALUMINUM NITRIDE
ZHILYAKOV, LA
KOSTANOVSKII, AV
HIGH TEMPERATURE, 1992, 30 (02) : 226 - 229
[43] Optical properties of sputtered amorphous beryllium nitride thin films
Khoshman, J.M.
Khan, A.
Kordesch, M.E.
Journal of Applied Physics, 2007, 101 (10):
[44] Optical properties of sputtered amorphous beryllium nitride thin films
Khoshman, J. M.
Khan, A.
Kordesch, M. E.
JOURNAL OF APPLIED PHYSICS, 2007, 101 (10)
[45] OPTICAL-PROPERTIES OF TITANIUM NITRIDE THIN-FILMS
TOMPKINS, HG
GREGORY, R
BOECK, B
SURFACE AND INTERFACE ANALYSIS, 1991, 17 (01) : 22 - 24
[46] Optical properties of reactively sputtered indium nitride thin films
Shamrell, RT
Parman, C
OPTICAL MATERIALS, 1999, 13 (03) : 289 - 292
[47] Growth and optical properties of gadolinium aluminum nitride thin films
Chen, Yigang
Shi, Xiaolei
Yang, Jing
Chen, Yiner
PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 9, NO 3-4, 2012, 9 (3-4): : 1040 - 1042
[48] Optical properties of amorphous hydrogenated silicon nitride thin films
Perez, Arllene M.
Santiago, Cesar
Renero, Francisco
Zuniga, Carlos
OPTICAL ENGINEERING, 2006, 45 (12)
[49] Pressure controlled tunable magnetic, electrical and optical properties of (Cu, Li)-codoped ZnO thin films
Zhang, Liqiang
Lu, Bin
Ye, Zhizhen
Lu, Jianguo
Huang, Jingyun
SOLID STATE COMMUNICATIONS, 2013, 170 : 53 - 57
[50] Solution-based Ag-doped ZnSe thin films with tunable electrical and optical properties
Xi, Yang
El Bouanani, Lidia
Xu, Zhe
Quevedo-Lopez, Manuel A.
Minary-Jolandan, Majid
JOURNAL OF MATERIALS CHEMISTRY C, 2015, 3 (38) : 9781 - 9788

← 1 2 3 4 5 →