Ion-induced radical desorption in high-density plasma and application to wall control of oxide etcher

被引：0
|
作者：
Nakamura, K [1 ]
Yoneda, S [1 ]
Sugai, H [1 ]
机构：
[1] Nagoya Univ, Dept Elect Engn, Chikusa Ku, Nagoya, Aichi 46401, Japan
来源：
INTERNATIONAL CONFERENCE ON PHENOMENA IN IONIZED GAS, VOL I, PROCEEDINGS | 1999年
关键词：
D O I：
暂无
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
引用
收藏
页码：65 / 66
页数：2
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