Effects of gradient interlayer on residual stress and cracking in TiN thin films

被引：0

作者：

Qi, X ^{[1
]}

Li, GY ^{[1
]}

Shi, XR ^{[1
]}

Lü, X ^{[1
]}

Li, PX ^{[1
]}

机构：

[1] Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, Shanghai 200030, Peoples R China

来源：

TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA | 2000年 / 10卷 / 03期

关键词：

TiN thin film; residual stress; gradient interlayer;

D O I：

暂无

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

The influence of a gradient interlayer on the residual stress and cracking in TiN thin films was studied as a function of the thickness of gradient interlayer. Both X-ray in-situ tensile testing and grazing method were used to measure the residual stress in thin films. In TiN films, there exists a residual stress of 10 GPa, which can be remarkably decreased by a gradient interlayer between film and substrate. The cracking behavior of films after tension shows that the crack of film/substrate system begins at interface between film and substrate.

引用

页码：294 / 297

页数：4

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