Shallow thermal donors in nitrogen-doped silicon single crystals

被引:2
|
作者
Voronkov, VV [1 ]
Voronkova, GI [1 ]
Batunina, AV [1 ]
Golovina, VN [1 ]
Arapkina, LV [1 ]
Tyurina, NB [1 ]
Gulyaeva, AS [1 ]
Mil'vidskii, MG [1 ]
机构
[1] State Rare Met Res Inst, Moscow 109017, Russia
关键词
D O I
10.1134/1.1470566
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Czochralski-grown nitrogen-doped silicon crystals contain shallow thermal donors (STD) which are not present in reference crystals. In the course of annealing at 600 or 650degreesC, the STD concentration reaches saturation and this concentration scales with nitrogen content N as N-1/2. This implies that an STD includes only one nitrogen atom and that the most likely model of the STD defect is the NOm complex of an interstitial nitrogen atom with in oxygen atoms. The number in is estimated as, on the average, m = 3 from data on the temperature dependence of the equilibrium constant for the complex formation reaction (C) 2002 MAIK "Nauka/Interperiodica".
引用
收藏
页码:727 / 731
页数:5
相关论文
共 50 条
  • [1] Shallow thermal donors in nitrogen-doped silicon single crystals
    V. V. Voronkov
    G. I. Voronkova
    A. V. Batunina
    V. N. Golovina
    L. V. Arapkina
    N. B. Tyurina
    A. S. Gulyaeva
    M. G. Mil’vidskii
    Physics of the Solid State, 2002, 44 : 727 - 731
  • [2] Shallow thermal donors in nitrogen-doped silicon
    Voronkov, VV
    Porrini, M
    Collareta, P
    Pretto, MG
    Scala, R
    Falster, R
    Voronkova, GI
    Batunina, AV
    Golovina, VN
    Arapkina, LV
    Guliaeva, AS
    Milvidski, MG
    JOURNAL OF APPLIED PHYSICS, 2001, 89 (08) : 4289 - 4293
  • [3] Local vibration modes of shallow thermal donors in nitrogen-doped CZ silicon crystals
    Inoue, N
    Nakatsu, M
    Ono, H
    PHYSICA B-CONDENSED MATTER, 2006, 376 : 101 - 104
  • [4] Structural elements of shallow thermal donors formed in nitrogen-gas-doped silicon crystals
    Hara, Akito
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (02): : 463 - 466
  • [5] On the mechanism underlying the elimination of nitrogen-oxygen shallow thermal donors in nitrogen-doped Czochralski silicon at elevated temperatures
    Zhao, Tong
    Hua, Chenqiang
    Lan, Wu
    Sun, Yuxin
    Wu, Defan
    Lu, Yunhao
    Ma, Xiangyang
    Yang, Deren
    JOURNAL OF APPLIED PHYSICS, 2021, 129 (14)
  • [6] On the mechanism of defect suppression in nitrogen-doped silicon single crystals
    von Ammon, W
    Hölzl, R
    Virbulis, J
    Dornberger, E
    Schmolke, R
    Gräf, D
    GETTERING AND DEFECT ENGINEERING IN SEMICONDUCTOR TECHNOLOGY, 2002, 82-84 : 17 - 24
  • [7] Formation of stacking faults in nitrogen-doped silicon single crystals
    Von Ammon, W
    Hölzl, R
    Wetzel, T
    Zemke, D
    Raming, G
    Blietz, M
    MICROELECTRONIC ENGINEERING, 2003, 66 (1-4) : 234 - 246
  • [8] Generation and motion of dislocations in nitrogen-doped silicon single crystals
    Mezhennyi, MV
    Milvidski, MG
    Reznik, VY
    Falster, RJ
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2002, 14 (48) : 12903 - 12908
  • [9] Nitrogen related shallow thermal donors in silicon
    Fujita, N.
    Jones, R.
    Oeberg, S.
    Briddon, P. R.
    APPLIED PHYSICS LETTERS, 2007, 91 (05)
  • [10] Formation of the thermal donors in the hydrogen-implanted nitrogen-doped silicon crystal
    Antonova, IV
    Yang, D
    Popov, VP
    Obodnikov, VI
    Misiuk, A
    MICROELECTRONIC ENGINEERING, 2003, 66 (1-4) : 367 - 372