Fluorinated resists for application at 157 nm: Recent advances.

被引：0
|
作者：
Houlihan, FM
Sakamuri, R
Romano, A
Dammel, RR
Conley, W
Miller, D
Sebald, M
Stepanenko, N
Markert, M
Mierau, U
Vermeir, I
Hohle, C
Itani, T
Shigematsu, M
Kawaguchi, E
机构：
[1] Clariant Corp, AZ Elect Mat, Somerville, NJ 08876 USA
[2] Infineon, Dresden, Germany
[3] SELETE, Tsukuba, Ibaraki, Japan
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2004年 / 228卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
81-PMSE
引用
收藏
页码：U427 / U427
页数：1
相关论文
共 50 条
  • [21] Recent advances in the design of resist materials for 157 nm lithography
    Houlihan, F
    Sakamuri, R
    Romano, A
    Rentkiewicz, D
    Dammel, RR
    Stepanenko, N
    Markert, M
    Vermeir, UMI
    Hohle, C
    Conley, W
    Miller, D
    Itani, T
    Shigematsu, M
    Kawaguchi, E
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2004, 17 (04) : 621 - 630
  • [22] 157-nm single-layer resists based on main-chain-fluorinated polymers
    Irie, S., 1600, Japan Society of Applied Physics (42):
  • [23] Fluoroaromatic resists for 157-nm lithography
    Fedynyshyn, TH
    Kunz, RR
    Sinta, RF
    Sworin, M
    Mowers, WA
    Goodman, RB
    Cabral, A
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2002, 15 (04) : 655 - 666
  • [24] High transparency resists for 157 nm lithography
    Itani, T
    Ishikawa, S
    Irie, S
    Hagiwara, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (06): : 3181 - 3185
  • [25] Fluoropolymer resists for 157-nm lithography
    Toriumi, M
    Shida, N
    Watanabe, H
    Yamazaki, T
    Ishikawa, S
    Itani, T
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIX, PTS 1 AND 2, 2002, 4690 : 191 - 199
  • [26] 157-nm single-layer resists based on main-chain-fluorinated polymers
    Irie, S
    Ishikawa, S
    Hagiwara, T
    Yamazaki, T
    Furukawa, T
    Itani, T
    Kawaguchi, Y
    Kodama, S
    Yokokoji, O
    Kaneko, I
    Takebe, Y
    Okada, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (6B): : 3743 - 3747
  • [27] Fluorinated materials for 157 nm lithography
    Poss, AJ
    Nalewajek, D
    Nair, HK
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XX, PTS 1 AND 2, 2003, 5039 : 533 - 538
  • [28] Polymyalgia rheumatica/temporal arteritis: recent advances.
    Barilla-LaBarca M.L.
    Lenschow D.J.
    Brasington Jr. R.D.
    Current Rheumatology Reports, 2002, 4 (1) : 39 - 46
  • [29] Neuronal ceroid lipofuscinosis. Recent advances.
    Chabrol, B
    ARCHIVES DE PEDIATRIE, 1997, 4 (07): : 671 - 675
  • [30] Silicon-containing resists for 157 nm applications
    Sooriyakumaran, R
    Fenzel-Alexander, D
    Fender, N
    Wallraff, GM
    Allen, RD
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVIII, PTS 1 AND 2, 2001, 4345 : 319 - 326
12345