Fluorinated resists for application at 157 nm: Recent advances.

被引：0
|
作者：
Houlihan, FM
Sakamuri, R
Romano, A
Dammel, RR
Conley, W
Miller, D
Sebald, M
Stepanenko, N
Markert, M
Mierau, U
Vermeir, I
Hohle, C
Itani, T
Shigematsu, M
Kawaguchi, E
机构：
[1] Clariant Corp, AZ Elect Mat, Somerville, NJ 08876 USA
[2] Infineon, Dresden, Germany
[3] SELETE, Tsukuba, Ibaraki, Japan
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2004年 / 228卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
81-PMSE
引用
收藏
页码：U427 / U427
页数：1
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