Fabrication of high-density, high aspect ratio, large-area bismuth telluride nanowire arrays by electrodeposition into porous anodic alumina templates

被引：0
|
作者：
Sander, MS
Prieto, AL
Gronsky, R [1 ]
Sands, T
Stacy, AM
机构：
[1] Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Dept Chem, Berkeley, CA 94720 USA
来源：
ADVANCED MATERIALS | 2002年 / 14卷 / 09期
关键词：
D O I：
10.1002/1521-4095(20020503)14:9<665::AID-ADMA665>3.0.CO;2-B
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The fabrication of high-density, high aspect ratio, large area bismuth telluride nanowire arrays by electrodeposition into porous anodic alumina templates was demonstrated. Wires with average diameter ≅ 45nm and aspect ratio greater than 1000 were prepared. The array-template composites used were thick, and had a high wire density permitting the assessment of the nanowire properties using bulk and thin film assessment techniques. The composite materials were suitable for direct incorporation into devices for potential thermoelectric applications.
引用
收藏
页码：665 / 667
页数：3
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