Fabrication of high-density, high aspect ratio, large-area bismuth telluride nanowire arrays by electrodeposition into porous anodic alumina templates

The fabrication of high-density, high aspect ratio, large area bismuth telluride nanowire arrays by electrodeposition into porous anodic alumina templates was demonstrated. Wires with average diameter ≅ 45nm and aspect ratio greater than 1000 were prepared. The array-template composites used were thick, and had a high wire density permitting the assessment of the nanowire properties using bulk and thin film assessment techniques. The composite materials were suitable for direct incorporation into devices for potential thermoelectric applications.