Three components positive type photosensitive poly(benzoxazole) based on poly(o-hydroxy amide), a dissolution inhibitor and a photo acid generator

被引：4

作者：

Ogura, Tomohito ^{[1
]}

Ueda, Mitsuru ^{[1
]}

机构：

[1] Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Organ & Polymer Mat, Meguro Ku, Tokyo 1528552, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2006年 / 19卷 / 02期

关键词：

polybenzoxazole; poly(o-hydroxy amide); photosensitive polymer; low-k materials; dissolution contrast; dissolution inhibitors;

D O I：

10.2494/photopolymer.19.291

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

[No abstract available]

引用

页码：291 / 292

页数：2

共 36 条

[31] An Alkaline-Developable, Negative-Working Photosensitive Polybenzoxazole Based on Poly(o-hydroxyamide), a Vinyl Sulfone-Type Cross-Linker, and a Novel Photobase Generator
Mizoguchi, Katsuhisa
Higashihara, Tomoya
Ueda, Mitsuru
MACROMOLECULES, 2009, 42 (11) : 3780 - 3787
[32] Three-component, negative-type, alkaline-developable, thermally stable, and photosensitive polymer based on poly(2,6-dihydroxy-1,5-naphthalene), a crosslinker, and a photoacid generator
Tsuchiya, K
Shibasaki, Y
Suzuki, M
Ueda, M
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 2004, 42 (09) : 2235 - 2240
[33] A positive-type alkaline-developable photosensitive polyimide based on the poly(amic acid) from 2,2′,6,6′-biphenyltetracarboxylic dianhydride and 1,3-bis(4-aminophenoxy)benzene, and a diazonaphthoquinone
Sakayori, Katsuya
Shibasaki, Yuji
Ueda, Mitsuru
POLYMER JOURNAL, 2006, 38 (11) : 1189 - 1193
[34] A Positive-Type Alkaline-Developable Photosensitive Polyimide Based on the Poly(amic acid) from 2,2′,6,6′-Biphenyltetracarboxylic Dianhydride and 1,3-Bis(4-aminophenoxy)benzene, and a Diazonaphthoquinone
Katsuya Sakayori
Yuji Shibasaki
Mitsuru Ueda
Polymer Journal, 2006, 38 : 1189 - 1193
[35] New Negative-type Photosensitive Alkaline-developable Semi-aromatic Polyimides with Low Dielectric Constants Based on Poly(amic acid) from Aromatic Diamine Containing Adamantyl Units and Alicyclic Dianhydrides, A Cross-linker, and A Photoacid Generator
Yasufumi Watanabe
Yuji Shibasaki
Shinji Ando
Mitsuru Ueda
Polymer Journal, 2005, 37 : 270 - 276
[36] New negative-type photosensitive alkaline-developable semi-aromatic polyimides with low dielectric constants based on poly(amic acid) from aromatic diamine containing adamantyl units and alicyclic dianhydrides, a cross-linker, and a photoacid generator
Watanabe, Y
Shibasaki, Y
Ando, S
Ueda, M
POLYMER JOURNAL, 2005, 37 (04) : 270 - 276

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