Three components positive type photosensitive poly(benzoxazole) based on poly(o-hydroxy amide), a dissolution inhibitor and a photo acid generator

被引：4

作者：

Ogura, Tomohito ^{[1
]}

Ueda, Mitsuru ^{[1
]}

机构：

[1] Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Organ & Polymer Mat, Meguro Ku, Tokyo 1528552, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2006年 / 19卷 / 02期

关键词：

polybenzoxazole; poly(o-hydroxy amide); photosensitive polymer; low-k materials; dissolution contrast; dissolution inhibitors;

D O I：

10.2494/photopolymer.19.291

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

[No abstract available]

引用

页码：291 / 292

页数：2

共 36 条

[21] Positive-working photosensitive alkaline-developable polyimide precursor based on semi-alicyclic poly(amide acid), vinyl ether crosslinker, and a photoacid generator
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Onishi, Hitoshi
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Tamai, Shoji
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2006, 19 (02) : 277 - 280
[22] Facile formulation of alkaline-developable positive-type photosensitive polyimide based on fluorinated poly(amic acid), poly(amic acid), and fluorinated diazonaphthoquinone
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Saito, Yuta
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Ueda, Mitsuru
JOURNAL OF MATERIALS CHEMISTRY C, 2013, 1 (14) : 2553 - 2560
[23] Alkaline-developable Positive-type Photosensitive Polyimide based on Fluorinated Poly(amic acid) and Fluorinated Diazonaphthoquinone
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[24] A new positive-type photosensitive alkaline-developable alicyclic polyimide based on poly(amic acid silylester) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound
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Shibasaki, Y
Ando, S
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CHEMISTRY OF MATERIALS, 2002, 14 (04) : 1762 - 1766
[25] Low-temperature curable, alkaline-developable, and negative-type photosensitive polyimide with high resolution and mechanical properties based on chain extendable poly(amic acid) and photo-base generator
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Karapala, Vamsi K.
Ueda, Mitsuru
Hsu, Chain-Shu
POLYMERS FOR ADVANCED TECHNOLOGIES, 2021, 32 (02) : 663 - 669
[26] Alkaline-developable and Positive-type Photosensitive Polyimide based on Fluorinated Poly(amic acid) from Diamine with High Hydrophobicity and Fluorinated Diazonaphtoquinone
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Ishida, Yoshihito
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JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2014, 27 (02) : 211 - 217
[27] Alkaline-developable positive-type photosensitive polyimide with high mechanical strength and high resolution based on chain extendable poly(amic acid), thermally degradable cross-linker and photoacid generator
Yeh, Yao-Ming
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JOURNAL OF POLYMER SCIENCE, 2020, 58 (07) : 948 - 955
[28] Low -Temperature -Curable and Positive -Type Photosensitive Polyimide with High Mechanical Strength, High Resolution and Good Pot -Life Based on Chain Extendable Poly(Amic Acid), Thermal Degradable Crosslinker, Chain Extender, Thermal Base Generator and Photoacid Generator
Yeh, Yao-Ming
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JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2020, 33 (06) : 623 - 630
[29] A positive type alkaline developable thermally stable and photosensitive polymer based on partially O-methylated poly (2,6-dihydroxy-1,5-naphthylene), an acidolytic de-cross-linker, and a photoacid generator
Tsuchiya, K
Shibasaki, Y
Ueda, M
POLYMER, 2004, 45 (20) : 6873 - 6878
[30] Synthesis and properties of novel aromatic poly(o-hydroxy amide)s and polybenzoxazoles based on the bis(ether benzoyl chloride)s from hydroquinone and its methyl-, tert-butyl-, and phenyl-substituted derivatives
Hsiao, SH
Dai, LR
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1999, 37 (13) : 2129 - 2136

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