Three components positive type photosensitive poly(benzoxazole) based on poly(o-hydroxy amide), a dissolution inhibitor and a photo acid generator

被引：4
|
作者：
Ogura, Tomohito [1 ]
Ueda, Mitsuru [1 ]
机构：
[1] Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Organ & Polymer Mat, Meguro Ku, Tokyo 1528552, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2006年 / 19卷 / 02期
关键词：
polybenzoxazole; poly(o-hydroxy amide); photosensitive polymer; low-k materials; dissolution contrast; dissolution inhibitors;
D O I：
10.2494/photopolymer.19.291
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
[No abstract available]
引用
收藏
页码：291 / 292
页数：2
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