Role of substrate bias during deposition of magnetron sputtered Ni, Ti and Ni-Ti thin films

被引：8
|
作者：
Priyadarshini, B. G. [1 ,2 ]
Gupta, M. Kumar [1 ]
Ghosh, S. [1 ]
Chakraborty, M. [1 ,3 ]
Aich, S. [1 ]
机构：
[1] Indian Inst Technol, Dept Met & Mat Engn, Kharagpur 721302, W Bengal, India
[2] IIT Delhi, Dept Phys, New Delhi 110016, India
[3] IIT, Sch Mech Sci, Bhubaneswar 751013, Orissa, India
来源：
SURFACE ENGINEERING | 2013年 / 29卷 / 09期
关键词：
Sputtering; Thin film; Nanocrystalline; Amorphous; Texture; Molecular dynamics; STABILITY;
D O I：
10.1179/1743294413Y.0000000182
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The present work aims to know how cosputtered NixTi1-x thin films differ from pure Ni and pure Ti thin film. Ni thin films exhibited < 111 >. texture irrespective of substrate bias voltage, while film surface roughness as revealed by atomic force microscopy was sensitive to biasing. The negative substrate bias voltage induced a change in preferential orientation of Ti thin films. On the other hand, Ni-Ti thin films exhibited amorphous nature irrespective of substrate bias voltage. The stability of the crystal structure of pure Ni, pure Ti films and that of amorphous structure of NixTi1-x films under high ion bombardment could be predicted by classical molecular dynamics based on embedded atom method potential.
引用
收藏
页码：689 / 694
页数：6
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