Mechanism for defect dependence of damage morphology in HfO2/SiO2 high reflectivity coating under nanosecond ultraviolet laser irradiation

被引：3
|
作者：
Yu, Zhenkun [1 ,2 ]
He, Hongbo [1 ]
He, Kai [1 ,2 ]
Qi, Hongji [1 ]
Wei, Sun [1 ,2 ]
Chen, Shunli [1 ,2 ]
机构：
[1] Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R China
[2] Chinese Acad Sci, Grad Sch, Beijing, Peoples R China
来源：
OPTIK | 2014年 / 125卷 / 18期
基金：
中国国家自然科学基金;
关键词：
Thin film; Laser-induced damage; Ultraviolet laser irradiation; FILM OPTICAL COATINGS; THIN-FILM; FEMTOSECOND; MODEL; BULK;
D O I：
10.1016/j.ijleo.2014.06.065
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
High reflectivity coating is designed and fabricated with HfO2/SiO2 stacks. The laser-induced damage experiment is prepared by a third-order harmonic generation of Nd:YAG laser (355 nm, 8 ns). Typical damage micrographs are obtained using atomic force microscope (AFM) and scanning electron microscope (SEM). A theoretical model based on the thermal transfer is tried to describe the defect dependence of damage morphology. Three situations are considered in this model: single defect, couple defects and high absorption film. The calculated results show that the second situation agrees well with the experiment. (c) 2014 Elsevier GmbH. All rights reserved.
引用
收藏
页码：5323 / 5326
页数：4
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