Mechanism for defect dependence of damage morphology in HfO2/SiO2 high reflectivity coating under nanosecond ultraviolet laser irradiation

被引：3

作者：

Yu, Zhenkun ^{[1
,2
]}

He, Hongbo ^{[1
]}

He, Kai ^{[1
,2
]}

Qi, Hongji ^{[1
]}

Wei, Sun ^{[1
,2
]}

Chen, Shunli ^{[1
,2
]}

机构：

[1] Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R China

[2] Chinese Acad Sci, Grad Sch, Beijing, Peoples R China

来源：

OPTIK | 2014年 / 125卷 / 18期

基金：

中国国家自然科学基金;

关键词：

Thin film; Laser-induced damage; Ultraviolet laser irradiation; FILM OPTICAL COATINGS; THIN-FILM; FEMTOSECOND; MODEL; BULK;

D O I：

10.1016/j.ijleo.2014.06.065

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

High reflectivity coating is designed and fabricated with HfO2/SiO2 stacks. The laser-induced damage experiment is prepared by a third-order harmonic generation of Nd:YAG laser (355 nm, 8 ns). Typical damage micrographs are obtained using atomic force microscope (AFM) and scanning electron microscope (SEM). A theoretical model based on the thermal transfer is tried to describe the defect dependence of damage morphology. Three situations are considered in this model: single defect, couple defects and high absorption film. The calculated results show that the second situation agrees well with the experiment. (c) 2014 Elsevier GmbH. All rights reserved.

引用

页码：5323 / 5326

页数：4

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