Fabrication of GaSb microlenses by photo and e-beam lithography and dry etching

被引：1

作者：

Papis, E

Piotrowska, A

Piotrowski, TT

Golaszewska, K

Ilka, L

Kruszka, R

Ratajczak, J

Katcki, J

Wróbel, J

Aleszkiewicz, M

Lukasiewicz, R

机构：

[1] Inst Electr Mat Technol, PL-02668 Warsaw, Poland

[2] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland

[3] Warsaw Univ Technol, Inst Microelect & Optoelect, PL-00672 Warsaw, Poland

来源：

FUNCTIONAL NANOMATERIALS FOR OPTOELECTRONICS AND OTHER APPLICATIONS | 2004年 / 99-100卷

关键词：

GaSb; microlens; sputter etching; reactive ion etching;

D O I：

10.4028/www.scientific.net/SSP.99-100.83

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Fabrication of surface-relief microstructures in GaSb for application in mid-infrared optoelectronic devices is described. Photo- and e-beam lithography was used to define patterns on GaSb surfaces. Ar/O-2 sputter etching and RIE in BCl3-based plasma were applied to transfer preshaped master into the GaSb substrate. Circular microlenses with an aspect ratio (height to diameter) 0.4/10 mum and circular gratings with 0.4 mum linewidth/1 mum period and 1.7 mum depth have been demonstrated.

引用

页码：83 / 86

页数：4

共 50 条

[31] CURRENT STATUS OF E-BEAM LITHOGRAPHY
HARADA, K
BULLETIN OF THE JAPAN SOCIETY OF PRECISION ENGINEERING, 1988, 22 (04): : 256 - 262
[32] Phononic engineering of silicon using "dots on the fly" e-beam lithography and plasma etching
Lacatena, V.
Haras, M.
Robillard, J. -F.
Monfray, S.
Skotnicki, T.
Dubois, E.
MICROELECTRONIC ENGINEERING, 2014, 121 : 131 - 134
[33] Inverse e-beam lithography on photomask for computational lithography
Choi, Jin
Park, Ji Soong
Shin, In Kyun
Jeon, Chan-Uk
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2014, 13 (01):
[34] Stencil mask fabrication for cell projection e-Beam lithography with silicon wafer
Choi, JS
Yi, SH
Choi, YY
Huh, H
Kim, J
PHOTOMASK AND X-RAY MASK TECHNOLOGY VI, 1999, 3748 : 486 - 494
[35] Direct Monte-Carlo simulation of dry e-beam etching of resist
Sidorov, F.
Rogozhin, A.
Bruk, M.
Zhikharev, E.
MICROELECTRONIC ENGINEERING, 2020, 227
[36] High speed e-beam lithography for gold nanoarray fabrication and use in nanotechnology
Trasobares, Jorge
Vaurette, Francois
Francois, Marc
Romijn, Hans
Codron, Jean-Louis
Vuillaume, Dominique
Theron, Didier
Clement, Nicolas
BEILSTEIN JOURNAL OF NANOTECHNOLOGY, 2014, 5 : 1918 - 1925
[37] FABRICATION OF FINE AND SMOOTH CURVED FEATURES BY e-BEAM LITHOGRAPHY SYSTEM.
Ohki, H.
Nakazawa, H.
Kosaka, Y.
Sato, H.
Asari, T.
Isobe, M.
Microelectronic Engineering, 1987, 6 (1-4) : 207 - 212
[38] TELECENTRIC BEAM POSITIONING FOR ADVANCED E-BEAM LITHOGRAPHY
STICKEL, W
LANGNER, GO
PETRIC, PF
MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 25 - 28
[39] E-beam lithography and optical near field lithography: new prospects in fabrication of various grating structures
Kley, EB
Clausnitzer, T
PHYSICS, THEORY, AND APPLICATIONS OF PERIODIC STRUCTURES IN OPTICS II, 2003, 5184 : 115 - 125
[40] PRACTICAL CONSIDERATIONS IN THE IMPLEMENTATION OF SAME-LEVEL MIXED (E-BEAM PHOTO) LITHOGRAPHY
BERKER, TD
BERNACKI, SE
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C110 - C110

← 1 2 3 4 5 →