Calculation of electronic and optical properties of 1550 nm VCSEL based on Group IV elements

被引:1
|
作者
Li, Hongqiang [1 ]
Zhang, Sai [1 ]
Zhang, Yikai [1 ]
Ding, Mingjun [1 ]
Lu, Xinyan [1 ,2 ]
Prades, Joan Daniel [3 ,4 ]
机构
[1] Tiangong Univ, Sch Elect & Informat Engn, Tianjin Key Lab Optoelect Detect Technol & Syst, Tianjin 300387, Peoples R China
[2] Tiangong Univ, Sch Mech Engn, Dept Mech Engn, Tianjin 300387, Peoples R China
[3] Univ Barcelona UB, Dept Elect & Biomed Engn, MIND, E-08028 Barcelona, Spain
[4] Univ Barcelona UB, Inst Nanosci & Nanotechnol IN 2UB, E-08028 Barcelona, Spain
基金
中国国家自然科学基金;
关键词
vertical cavity surface emitting lasers; distributed Bragg reflector; quantum well; SiGe;
D O I
10.1088/1555-6611/abd8cc
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Si/SiGe quantum well (QW) structures show considerable potential in revolutionising Si photonics. This study proposes a novel 1550 nm vertical cavity surface-emitting laser (VCSEL) that is based on Group IV elements and composed of Si/SiO2 distributed Bragg reflectors and Si/Si0.13Ge0.87 QWs. Material composition and QW width in the active region are optimised. The proposed Group IV-based VCSEL can exhibit epitaxial growth on a vertical binary blazed grating coupler and increase coupling efficiency relative to the traditional Group III-V-based VCSEL with an Si waveguide. The proposed VCSEL on Si based on the Group IV element scheme is a cheap, high-yielding and temperature-insensitive on-chip light source that can be used in large-scale, high-density monolithic integration.
引用
收藏
页数:6
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