Prolific cluster emission in sputtering of phenylalanine by argon-cluster ion bombardment

被引:7
|
作者
Gnaser, Hubert [1 ,2 ,3 ]
Fujii, Makiko [1 ]
Nakagawa, Shunichirou [1 ]
Seki, Toshio [1 ,4 ]
Aoki, Takaaki [1 ,4 ]
Matsuo, Jiro [1 ,4 ]
机构
[1] Kyoto Univ, Quantum Sci & Engn Ctr, Kyoto 6110011, Japan
[2] Univ Kaiserslautern, Dept Phys, D-67663 Kaiserslautern, Germany
[3] Univ Kaiserslautern, Res Ctr OPTIMAS, D-67663 Kaiserslautern, Germany
[4] Japan Sci & Technol Agcy JST, CREST, Chiyoda Ku, Tokyo 1020075, Japan
关键词
Ar cluster ions; Phenylalanine; Ion emission; TOF-SIMS; MASS-SPECTROMETRY; SIZE; ENERGY; FILMS; POLYMERS; DYNAMICS; SIMS;
D O I
10.1016/j.ijms.2013.12.024
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
Large Ar-n(+) cluster ions (with n similar to 1500 Ar atoms per cluster) with a bombarding energy of 10 keV were used to investigate the sputter-induced emission of positive secondary ions from a phenylalanine specimen by orthogonal time-of-flight SIMS. An abundant flux of phenylalanine cluster ions (M-n+H)(+) with n <= 12 was observed. The yield of dimers relative to monomers is found to amount to 50 - 60% whereas that of turners and tetramers is roughly 10%. Tentatively, this prolific formation of these cluster species can then be ascribed to the concerted action of the large number of Ar atoms within their impact zone at the surface: these low-energy Ar species (with an average energy of only few eV) may effect the soft cleavage of the phenylalanine bonds in the solid and lead, eventually, to the intact emission of these phenylalanine moieties. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:54 / 57
页数:4
相关论文
共 50 条
  • [21] XPS study during a soft and progressive sputtering of a monolayer on indium phosphide by argon cluster bombardment
    Aureau, Damien
    Fregnaux, Mathieu
    Njel, Christian
    Vigneron, Jackie
    Bouttemy, Muriel
    Goncalves, Anne-Marie
    Etcheberry, Arnaud
    SURFACE AND INTERFACE ANALYSIS, 2018, 50 (11) : 1163 - 1167
  • [22] Matrix-free detection of intact ions from proteins in argon-cluster secondary ion mass spectrometry
    Mochiji, Kozo
    Hashinokuchi, Michihiro
    Moritani, Kousuke
    Toyoda, Norlaki
    RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 2009, 23 (05) : 648 - 652
  • [23] Cluster size and velocity dependences of sputtering and secondary ion emission under gold cluster impact
    Wehbe, N.
    Fallavier, M.
    Della Negra, S.
    Depauw, J.
    Brunelle, A.
    Andersen, H. H.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2010, 268 (17-18): : 2596 - 2602
  • [24] Au sputtering by cluster bombardment: A molecular dynamics study
    Colla, TJ
    Urbassek, HM
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2000, 164 : 687 - 696
  • [25] Peptide dissociation patterns in secondary ion mass spectrometry under large argon cluster ion bombardment
    Gnaser, Hubert
    Fujii, Makiko
    Nakagawa, Shunichirou
    Seki, Toshio
    Aoki, Takaaki
    Matsuo, Jiro
    RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 2013, 27 (13) : 1490 - 1496
  • [26] NEGATIVE-ION CLUSTER SPUTTERING OF SIC AND LIF DURING CS+ ION-BOMBARDMENT
    DZHABBARGANOV, R
    KANAEVA, EM
    ABDULLAEV, AK
    IZVESTIYA AKADEMII NAUK SERIYA FIZICHESKAYA, 1994, 58 (04): : 165 - 169
  • [27] EXIT CONDITIONS FOR SECONDARY-ION EMISSION INDUCED BY KEV CLUSTER BOMBARDMENT
    RAY, KB
    PARK, MA
    SCHWEIKERT, EA
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 82 (02): : 317 - 322
  • [28] Borate nonlinear optical single crystal surface finishing by argon cluster ion sputtering
    Korobeishchikov, N. G.
    Nikolaev, I., V
    Atuchin, V. V.
    Prosvirin, I. P.
    Tolstogouzov, A.
    Pelenovich, V
    Fu, D. J.
    SURFACES AND INTERFACES, 2021, 27
  • [29] Sputtered ion emission under size-selected Arn+ cluster ion bombardment
    Gnaser, Hubert
    Ichiki, Kazuya
    Matsuo, Jiro
    SURFACE AND INTERFACE ANALYSIS, 2013, 45 (01) : 138 - 142
  • [30] Universal Equation for Argon Gas Cluster Sputtering Yields
    Seah, M. P.
    JOURNAL OF PHYSICAL CHEMISTRY C, 2013, 117 (24): : 12622 - 12632