Comparison of Advanced Transport Models for Nanoscale nMOSFETs

被引:1
|
作者
Palestri, P. [1 ]
Alexander, C. [2 ]
Asenov, A. [2 ]
Baccarani, G. [3 ]
Bournel, A. [4 ]
Braccioli, M. [3 ]
Cheng, B. [2 ]
Dollfus, P. [4 ]
Esposito, A. [5 ]
Esseni, D. [1 ]
Ghetti, A. [6 ]
Fiegna, C. [3 ]
Fiori, G. [4 ]
Aubry-Fortuna, V. [4 ]
Iannaccone, G. [4 ]
Martinez, A. [2 ]
Majkusiak, B. [7 ]
Monfray, S. [8 ]
Reggiani, S. [3 ]
Riddet, C. [2 ]
Saint-Martin, J. [4 ]
Sangiorgi, E. [3 ]
Schenk, A. [5 ]
Selmi, L. [1 ]
Silvestri, L. [3 ]
Walczak, J. [7 ,9 ]
机构
[1] Univ Udine, IUNET, DIEGM, Via Sci 208, I-33100 Udine, Italy
[2] Univ Glasgow, Glasgow, Lanark, Scotland
[3] Univ Bologna, IUNET, ARCES, Bologna, Italy
[4] Univ Paris, IEF, CNRS, Orsay, France
[5] ETH, CH-8092 Zurich, Switzerland
[6] R & D Technol Dev, Numonyx, I-20041 Agrate Brianza, Italy
[7] Warsaw Univ Technol, Warsaw, Poland
[8] ST Microelect, Crolles, France
[9] Univ Pisa, IUNET, Pisa, Italy
关键词
MONTE-CARLO; MOBILITY MODEL; ELECTRON; MOSFETS; PERFORMANCE; SIMULATION; SOI;
D O I
10.1109/ULIS.2009.4897554
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper we mutually compare advanced modeling approaches for the determination of the drain current in nanoscale MOSFETs. Transport models range from Drift-Diffusion to direct solution of the Boltzmann Transport equation with the Monte-Carlo methods. Template devices representative of 22mn Double-Gate and 32mn FDSOI transistors were used as a common benchmark to highlight the differences between the quantitative predictions of different approaches. Our results set a benchmark to assess modeling tools for nanometric MOSFETs.
引用
收藏
页码:125 / +
页数:2
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