Multilevel diffractive optical elements fabricated with a single amplitude-phase mask

被引：6
|
作者：
Pawlowski, E
Engel, H
机构：
[1] Heinrich-Hertz-Institut für Nachrichtentechnik Berlin GmbH, 10587 Berlin
来源：
PURE AND APPLIED OPTICS | 1997年 / 6卷 / 06期
关键词：
D O I：
10.1088/0963-9659/6/6/007
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
To simplify the fabrication process of multilevel diffractive optical elements a new fabrication technique is presented. The fabrication process is based on a single optical lithography step and a subsequent dry-etching process. Lateral structures with dimensions of 180 nm were transferred. The fabricated diffractive optical elements show high optical performance with diffraction efficiencies of over 90%.
引用
收藏
页码：655 / 662
页数：8
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