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- [41] Total ionizing dose effects on graphene-based charge-trapping memorySCIENCE CHINA-INFORMATION SCIENCES, 2019, 62 (12)Xi, Kai论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Chinese Acad Sci, Inst Microelect, Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaBi, Jinshun论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Sch Microelect, Beijing 100049, Peoples R China Chinese Acad Sci, Inst Microelect, Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaMajumdar, Sandip论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China ICFAI Univ, Dept Sci & Technol, Agartala 799210, India Chinese Acad Sci, Inst Microelect, Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaLi, Bo论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Chinese Acad Sci, Inst Microelect, Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaLiu, Jing论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Chinese Acad Sci, Inst Microelect, Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaXu, Yannan论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Sch Microelect, Beijing 100049, Peoples R China Chinese Acad Sci, Inst Microelect, Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R ChinaLiu, Ming论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China Chinese Acad Sci, Inst Microelect, Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China
- [42] Total dose ionizing irradiation effects on a static random access memory field programmable gate array附视频半导体学报, 2012, (03) : 42 - 47论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:李豫东论文数: 0 引用数: 0 h-index: 0机构: Xinjiang Technical Institute of Physics & Chemistry,Chinese Academy of Sciences Xinjiang Province Key Laboratory of Electronics Information Material and Device Xinjiang Technical Institute of Physics & Chemistry,Chinese Academy of Sciences论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:李明论文数: 0 引用数: 0 h-index: 0机构: Xinjiang Technical Institute of Physics & Chemistry,Chinese Academy of Sciences Xinjiang Province Kev Laboratory of Electronics Information Material and Xinjiang Technical Institute of Physics & Chemistry,Chinese Academy of Sciences
- [43] Study of Total-Ionizing-Dose Effects on a Single-Event-Hardened Phase-Locked LoopIEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2018, 65 (04) : 997 - 1004Chen, Zhuojun论文数: 0 引用数: 0 h-index: 0机构: Hunan Univ, Sch Phys & Elect, Minist Educ, Key Lab Micronano Optoelect Devices, Changsha 410082, Hunan, Peoples R China Hunan Univ, Sch Phys & Elect, Minist Educ, Key Lab Micronano Optoelect Devices, Changsha 410082, Hunan, Peoples R ChinaDing, Ding论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Ceram, Key Lab Inorgan Coating Mat, Shanghai 200050, Peoples R China Hunan Univ, Sch Phys & Elect, Minist Educ, Key Lab Micronano Optoelect Devices, Changsha 410082, Hunan, Peoples R ChinaDong, Yemin论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China Hunan Univ, Sch Phys & Elect, Minist Educ, Key Lab Micronano Optoelect Devices, Changsha 410082, Hunan, Peoples R ChinaShan, Yi论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China Hunan Univ, Sch Phys & Elect, Minist Educ, Key Lab Micronano Optoelect Devices, Changsha 410082, Hunan, Peoples R ChinaZhou, Shuxing论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Key Lab Funct Mat & Devices Special Environm, Urumqi 830011, Peoples R China Hunan Univ, Sch Phys & Elect, Minist Educ, Key Lab Micronano Optoelect Devices, Changsha 410082, Hunan, Peoples R ChinaHu, Yuanyuan论文数: 0 引用数: 0 h-index: 0机构: Hunan Univ, Sch Phys & Elect, Minist Educ, Key Lab Micronano Optoelect Devices, Changsha 410082, Hunan, Peoples R China Hunan Univ, Sch Phys & Elect, Minist Educ, Key Lab Micronano Optoelect Devices, Changsha 410082, Hunan, Peoples R ChinaZheng, Yunlong论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China Hunan Univ, Sch Phys & Elect, Minist Educ, Key Lab Micronano Optoelect Devices, Changsha 410082, Hunan, Peoples R ChinaPeng, Chao论文数: 0 引用数: 0 h-index: 0机构: China Elect Product Reliabil & Environm Testing R, Sci & Technol Reliabil Phys & Applicat Elect Comp, Guangzhou 510610, Guangdong, Peoples R China Hunan Univ, Sch Phys & Elect, Minist Educ, Key Lab Micronano Optoelect Devices, Changsha 410082, Hunan, Peoples R ChinaChen, Rongmei论文数: 0 引用数: 0 h-index: 0机构: Tsinghua Univ, Key Lab Particle & Radiat Imaging, Minist Educ, Dept Engn Phys, Beijing 100084, Peoples R China Hunan Univ, Sch Phys & Elect, Minist Educ, Key Lab Micronano Optoelect Devices, Changsha 410082, Hunan, Peoples R China
- [44] Program time effects on Total ionizing Dose tolerance of Sidewall Spacer Memory Bit Cell2019 27TH AUSTROCHIP WORKSHOP ON MICROELECTRONICS (AUSTROCHIP), 2019, : 55 - 58Vincenzi, Tommaso论文数: 0 引用数: 0 h-index: 0机构: Ams AG, Unterpremstatten, Austria Ams AG, Unterpremstatten, AustriaSchatzberger, Gregor论文数: 0 引用数: 0 h-index: 0机构: Ams AG, Unterpremstatten, Austria Ams AG, Unterpremstatten, Austria论文数: 引用数: h-index:机构:
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- [49] Total-Ionizing-Dose Effects on Threshold Voltage Distribution of 64-Layer 3D NAND Memories2022 IEEE RADIATION EFFECTS DATA WORKSHOP (REDW) (IN CONJUNCTION WITH 2022 NSREC), 2022, : 221 - 225Kumar, Mondol Anik论文数: 0 引用数: 0 h-index: 0机构: Univ Alabama, Dept Elect & Comp Engn, Huntsville, AL 35899 USA Univ Alabama, Dept Elect & Comp Engn, Huntsville, AL 35899 USA论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:Wasiolek, Maryla论文数: 0 引用数: 0 h-index: 0机构: Sandia Natl Labs, Livermore, CA 94550 USA Univ Alabama, Dept Elect & Comp Engn, Huntsville, AL 35899 USAHattar, Khalid论文数: 0 引用数: 0 h-index: 0机构: Sandia Natl Labs, Livermore, CA 94550 USA Univ Alabama, Dept Elect & Comp Engn, Huntsville, AL 35899 USABoykin, Timothy论文数: 0 引用数: 0 h-index: 0机构: Univ Alabama, Dept Elect & Comp Engn, Huntsville, AL 35899 USA Univ Alabama, Dept Elect & Comp Engn, Huntsville, AL 35899 USARay, Biswajit论文数: 0 引用数: 0 h-index: 0机构: Univ Alabama, Dept Elect & Comp Engn, Huntsville, AL 35899 USA Univ Alabama, Dept Elect & Comp Engn, Huntsville, AL 35899 USA
- [50] Total-Ionizing-Dose Effects on Threshold Switching in 1T-TaS2 Charge Density Wave DevicesIEEE ELECTRON DEVICE LETTERS, 2017, 38 (12) : 1724 - 1727Liu, G.论文数: 0 引用数: 0 h-index: 0机构: Univ Calif Riverside, Phonon Optimized Engn Mat Ctr, Dept Elect & Comp Engn, Nanodevice Lab,Bourns Coll Engn, Riverside, CA 92521 USA Univ Calif Riverside, Phonon Optimized Engn Mat Ctr, Dept Elect & Comp Engn, Nanodevice Lab,Bourns Coll Engn, Riverside, CA 92521 USAZhang, E. X.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Univ Calif Riverside, Phonon Optimized Engn Mat Ctr, Dept Elect & Comp Engn, Nanodevice Lab,Bourns Coll Engn, Riverside, CA 92521 USALiang, C. D.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Univ Calif Riverside, Phonon Optimized Engn Mat Ctr, Dept Elect & Comp Engn, Nanodevice Lab,Bourns Coll Engn, Riverside, CA 92521 USABloodgood, M. A.论文数: 0 引用数: 0 h-index: 0机构: Univ Georgia, Dept Chem, Athens, GA 30602 USA Univ Calif Riverside, Phonon Optimized Engn Mat Ctr, Dept Elect & Comp Engn, Nanodevice Lab,Bourns Coll Engn, Riverside, CA 92521 USASalguero, T. T.论文数: 0 引用数: 0 h-index: 0机构: Univ Georgia, Dept Chem, Athens, GA 30602 USA Univ Calif Riverside, Phonon Optimized Engn Mat Ctr, Dept Elect & Comp Engn, Nanodevice Lab,Bourns Coll Engn, Riverside, CA 92521 USAFleetwood, D. M.论文数: 0 引用数: 0 h-index: 0机构: Vanderbilt Univ, Dept Elect Engn & Comp Sci, 221 Kirkland Hall, Nashville, TN 37235 USA Univ Calif Riverside, Phonon Optimized Engn Mat Ctr, Dept Elect & Comp Engn, Nanodevice Lab,Bourns Coll Engn, Riverside, CA 92521 USABalandin, A. A.论文数: 0 引用数: 0 h-index: 0机构: Univ Calif Riverside, Phonon Optimized Engn Mat Ctr, Dept Elect & Comp Engn, Nanodevice Lab,Bourns Coll Engn, Riverside, CA 92521 USA Univ Calif Riverside, Phonon Optimized Engn Mat Ctr, Dept Elect & Comp Engn, Nanodevice Lab,Bourns Coll Engn, Riverside, CA 92521 USA