Total-Ionizing-Dose Effects on Threshold Voltage Distribution of 64-Layer 3D NAND Memories

被引:6
|
作者
Kumar, Mondol Anik [1 ]
Raquibuzzaman, Md [1 ]
Buddhanoy, Matchima [1 ]
Wasiolek, Maryla [2 ]
Hattar, Khalid [2 ]
Boykin, Timothy [1 ]
Ray, Biswajit [1 ]
机构
[1] Univ Alabama, Dept Elect & Comp Engn, Huntsville, AL 35899 USA
[2] Sandia Natl Labs, Livermore, CA 94550 USA
基金
美国国家科学基金会;
关键词
3-D NAND; ionizing radiation; tri-level-cell (TLC); total ionizing dose (TID); FLASH;
D O I
10.1109/REDW56037.2022.9921459
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We measure total-ionizing-dose (TID) induced threshold voltage (V-t) loss of a commercial 64-layer triple-level-cell (TLC) 3D NAND memory using user-mode commands. Our experiments show that Vt distributions closely follow Gaussian distributions. At increasing TID, the distributions shift toward lower average values and the distribution widths widen. We calculate exact cell V-t shifts from the pre-irradiation conditions at different TID values. We find that V-t loss (Delta V-t) distributions also follow Gaussian distributions. We also find that Delta V-t values strongly depend on the cell programmed states.
引用
收藏
页码:221 / 225
页数:5
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