X-ray Full Field Microscopy at 30 keV

被引:21
|
作者
Marschall, F. [1 ]
Last, A. [1 ]
Simon, M. [2 ]
Kluge, M. [1 ]
Nazmov, V. [1 ]
Vogt, H. [1 ]
Ogurreck, M. [3 ]
Greving, I. [3 ]
Mohr, J. [1 ]
机构
[1] KIT, IMT, Karlsruhe, Germany
[2] PI miCos GmbH, D-79427 Eschbach, Germany
[3] Inst Mat Res, Helmholtz Zentrum Geesthacht, Geesthacht, Germany
来源
22ND INTERNATIONAL CONGRESS ON X-RAY OPTICS AND MICROANALYSIS | 2014年 / 499卷
关键词
D O I
10.1088/1742-6596/499/1/012007
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In our X-ray full field microscopy experiments, we demonstrated a resolution better than 260 nm over the entire field of view of 80 mu m x 80 mu m at 30 keV. Our experimental setup at PETRA III, P05, had a length of about 5 m consisting of an illumination optics, an imaging lens and a detector. For imaging, we used a compound refractive lens (CLR) consisting of mr-L negative photo resist, which was fabricated by deep X-ray lithography. As illumination optics, we choose a refractive rolled X-ray prism lens, which was adapted to the numerical aperture of the imaging lens.
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页数:6
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