X-ray Full Field Microscopy at 30 keV

被引：21

作者：

Marschall, F. ^{[1
]}

Last, A. ^{[1
]}

Simon, M. ^{[2
]}

Kluge, M. ^{[1
]}

Nazmov, V. ^{[1
]}

Vogt, H. ^{[1
]}

Ogurreck, M. ^{[3
]}

Greving, I. ^{[3
]}

Mohr, J. ^{[1
]}

机构：

[1] KIT, IMT, Karlsruhe, Germany

[2] PI miCos GmbH, D-79427 Eschbach, Germany

[3] Inst Mat Res, Helmholtz Zentrum Geesthacht, Geesthacht, Germany

来源：

22ND INTERNATIONAL CONGRESS ON X-RAY OPTICS AND MICROANALYSIS | 2014年 / 499卷

关键词：

D O I：

10.1088/1742-6596/499/1/012007

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In our X-ray full field microscopy experiments, we demonstrated a resolution better than 260 nm over the entire field of view of 80 mu m x 80 mu m at 30 keV. Our experimental setup at PETRA III, P05, had a length of about 5 m consisting of an illumination optics, an imaging lens and a detector. For imaging, we used a compound refractive lens (CLR) consisting of mr-L negative photo resist, which was fabricated by deep X-ray lithography. As illumination optics, we choose a refractive rolled X-ray prism lens, which was adapted to the numerical aperture of the imaging lens.

引用

页数：6

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