Materials Characterization by Near-field Scanning Microwave Microscopy

被引：0

作者：

Gu, Sijia ^{[1
]}

Lin, Tianjun ^{[1
]}

Lasri, Tuami ^{[1
]}

机构：

[1] Univ Lille 1, Inst Elect Microelect & Nanotechnol, Ave Poincare CS 60069, F-59652 Villeneuve Dascq, France

来源：

2016 PROGRESS IN ELECTROMAGNETICS RESEARCH SYMPOSIUM (PIERS) | 2016年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Near-field scanning microwave microscope (NFSMM) has potentials to achieve characterizations of materials with high spatial resolution and sensitivity. A wide range of applications have been addressed such as dielectric constant measurement, impedance analysis of metals and semiconductor materials/devices, gas and chemical sensing, etc. [1, 2].

引用

页码：1474 / 1475

页数：2

共 50 条

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