Low-loss amorphous silicon-on-insulator technology for photonic integrated circuitry

被引：108
|
作者：
Selvaraja, Shankar Kumar [1 ]
Sleeckx, Erik [2 ]
Schaekers, Marc [2 ]
Bogaerts, Wim [1 ]
Van Thourhout, Dries [1 ]
Dumon, Pieter [1 ]
Baets, Roel [1 ]
机构：
[1] Univ Ghent, IMEC, Dept Informat Technol, B-9000 Ghent, Belgium
[2] IMEC, B-3001 Louvain, Belgium
来源：
OPTICS COMMUNICATIONS | 2009年 / 282卷 / 09期
关键词：
Integrated optics; Waveguides; Amorphous silicon; WAVE-GUIDES; AWG DEMULTIPLEXER;
D O I：
10.1016/j.optcom.2009.01.021
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We report the fabrication of low-loss amorphous silicon photonic wires deposited by plasma enhanced chemical vapor deposition. Single mode photonic wires were fabricated by 193 nm optical lithography and dry etching. Propagation loss measurements show a loss of 3.46 dB/cm for photonic wires (480 x 220 nm) and 1.34 dB/cm for ridge waveguides. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码：1767 / 1770
页数：4
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