Low-loss amorphous silicon-on-insulator technology for photonic integrated circuitry

被引：108

作者：

Selvaraja, Shankar Kumar ^{[1
]}

Sleeckx, Erik ^{[2
]}

Schaekers, Marc ^{[2
]}

Bogaerts, Wim ^{[1
]}

Van Thourhout, Dries ^{[1
]}

Dumon, Pieter ^{[1
]}

Baets, Roel ^{[1
]}

机构：

[1] Univ Ghent, IMEC, Dept Informat Technol, B-9000 Ghent, Belgium

[2] IMEC, B-3001 Louvain, Belgium

来源：

OPTICS COMMUNICATIONS | 2009年 / 282卷 / 09期

关键词：

Integrated optics; Waveguides; Amorphous silicon; WAVE-GUIDES; AWG DEMULTIPLEXER;

D O I：

10.1016/j.optcom.2009.01.021

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We report the fabrication of low-loss amorphous silicon photonic wires deposited by plasma enhanced chemical vapor deposition. Single mode photonic wires were fabricated by 193 nm optical lithography and dry etching. Propagation loss measurements show a loss of 3.46 dB/cm for photonic wires (480 x 220 nm) and 1.34 dB/cm for ridge waveguides. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：1767 / 1770

页数：4

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