Computer Simulation of Experimental Methods to Investigate Materials and Structures of Micro- and Nanoelectronics

被引:0
|
作者
Kholomina, T. A. [1 ]
Malchenko, S., I [1 ]
Gudzev, V. V. [1 ]
Rybin, N. B. [1 ]
机构
[1] Ryazan State Radio Engn Univ, Dept Micro & Nanoelect, Ryazan, Russia
关键词
laboratory-based work; virtual laboratory; physical processes;
D O I
暂无
中图分类号
TP301 [理论、方法];
学科分类号
081202 ;
摘要
The paper discusses the basic principles and implementation of laboratory complexes to realize methods for investigating properties of materials and structures for solid state electronics and nanoelectronics. The following laboratory complexes are developed: studying resistance of solid dielectrics; thermal analysis of metal alloys; analysis of spectra of deep levels using DLTS method. Virtual laboratory complexes developed in the environment of engineering graphical programming NI LabVIEW.
引用
收藏
页码:309 / 313
页数:5
相关论文
共 50 条
  • [1] Straintronics: a new trend in micro- and nanoelectronics and materials science
    Bukharaev, A. A.
    Zvezdin, K.
    Pyatakov, A. P.
    Fetisov, Y. K.
    PHYSICS-USPEKHI, 2018, 61 (12) : 1175 - 1212
  • [2] Method of Processing Quartz Accessories in the Manufacturing of the Structures of Micro- and Nanoelectronics
    Ismailov, T. A.
    Sarkarov, T. E.
    Shakhmaeva, A. R.
    Shangereeva, B. A.
    GLASS AND CERAMICS, 2019, 75 (11-12) : 488 - 490
  • [3] Method of Processing Quartz Accessories in the Manufacturing of the Structures of Micro- and Nanoelectronics
    T. A. Ismailov
    T. É. Sarkarov
    A. R. Shakhmaeva
    B. A. Shangereeva
    Glass and Ceramics, 2019, 75 : 488 - 490
  • [4] Components of Micro- and Nanoelectronics Based on Silicon Structures for Cryogenic Temperatures
    Druzhinin, Anatoly
    Ostrovskii, Igor
    Khoverko, Yuriy
    Yatsukhnenko, Serhii
    Druzhinin, Anatoly
    Ostrovskii, Igor
    Khoverko, Yuriy
    2016 IEEE 36TH INTERNATIONAL CONFERENCE ON ELECTRONICS AND NANOTECHNOLOGY (ELNANO), 2016, : 147 - 150
  • [5] Computer simulation of micro- and nano- structures at electron and ion lithography
    Vutova, K.
    Mladenov, G.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2008, 10 (02): : 233 - 239
  • [6] Computer simulation of micro- and nano- structures at electron and ion lithography
    Vutova, K.
    Mladenov, G.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2008, 10 (01): : 91 - 97
  • [7] Materials, Processes, and Reliability for Advanced Interconnects for Micro- and Nanoelectronics - 2009: Preface
    Gall, Martin
    Grill, Alfred
    Iacopi, Francesca
    Koike, Junichi
    Usui, Takamasa
    Materials Research Society Symposium Proceedings, 2009, 1156
  • [8] Molecular simulation and experimental studies of gas separation in micro- and mesoporous materials
    Koh, CA
    Nooney, R
    Westacott, R
    Tahir, S
    ADSORPTION SCIENCE AND TECHNOLOGY, 2000, : 351 - 355
  • [9] Evolution of Models and Algorithms for Calculating the Parameters of Technological Processes to Obtain Materials for Micro- and Nanoelectronics
    Krapukhin V.V.
    Kosushkin V.G.
    Kozhitov L.V.
    Kostishin V.G.
    Muratov D.G.
    Popkova A.V.
    Russ. Microelectr., 8 (571-579): : 571 - 579
  • [10] Problems in measurements of parameters of elements and structures in modern micro- and nanoelectronics considering TiN/Ti diffusion barrier structures as an example
    Smirnov, D. I.
    Giniyatyllin, R. M.
    Zyul'kov, I. Yu
    Medetov, N. A.
    Gerasimenko, N. N.
    TECHNICAL PHYSICS LETTERS, 2013, 39 (07) : 640 - 643