Substrate Dependent Growth of Microcrystalline Silicon

被引:0
|
作者
Bailly, Mark [1 ]
Carpenter, Joe V., III [1 ]
Holman, Zachary [1 ]
Bowden, Stuart [1 ]
机构
[1] Arizona State Univ, Ira A Fulton Sch Engn, Sch Elect Comp & Energy Engn, Tempe, AZ 85287 USA
来源
2014 IEEE 40TH PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC) | 2014年
关键词
amorphous materials; heterojunction; microcrystals; photovoltaic cells; silicon; substrates; FILMS;
D O I
暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Silicon (Si) heterojunction solar cells with efficiencies approaching 24.7% are poised to replace Si diffused junction solar cells. To further improve their efficiency, microcrystalline Si (uc-Si) could replace the amorphous Si (a-Si) emitter layer, thus improving the effective doping and increasing transparency. This improvement in efficiency would come at little additional cost and could be accomplished by altering the plasma-enhanced chemical vapor deposition (PECVD) conditions. A uc-Si film was deposited on glass, a-Si, c-Si, silicon dioxide, and sapphire. When integrated over the AM 1.5G spectrum, the a-Si:H film absorbs 3 mA/cm(2) the 50% crystalline uc-Si:H film absorbs 1.7 mA/cm(2).
引用
收藏
页码:1201 / 1205
页数:5
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