Precursor synthesis and atomic layer deposition of CoOx thin films

被引:0
|
作者
Kim, Jiyeon [1 ]
Fischer, Roland [1 ]
Devi, Anjana [1 ]
机构
[1] Ruhr Univ Bochum, Chem & Biochem, Bochum, Germany
关键词
D O I
暂无
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
499
引用
收藏
页数:1
相关论文
共 50 条
  • [1] Synthesis of VO2 thin Films by Atomic Layer Deposition with TEMAV as Precursor
    Zhang, Kai
    Tangirala, Madhavi
    Nminibapiel, David
    Cao, Wei
    Pallem, Venkateswara
    Dussarrat, Christian
    Baumgart, Helmut
    ATOMIC LAYER DEPOSITION APPLICATIONS 8, 2012, 50 (13): : 175 - 182
  • [2] Atomic Layer Deposition of Ruthenium Thin Films from an Amidinate Precursor
    Wang, Hongtao
    Gordon, Roy G.
    Alvis, Roger
    Ulfig, Robert M.
    CHEMICAL VAPOR DEPOSITION, 2009, 15 (10-12) : 312 - 319
  • [3] Spectral analysis on CoOx films deposited by atomic layer deposition
    Xu, Xuefeng
    Wang, Jingang
    Sun, Mengtao
    CHEMICAL PHYSICS LETTERS, 2020, 742
  • [4] Precursor design for the atomic layer deposition of hafnium oxide/oxynitride thin films
    Medina, Phillip A.
    Patil, Siddappa A.
    Fahlman, Bradley D.
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2012, 244
  • [5] Atomic layer deposition of tantalum oxide thin films from iodide precursor
    Kukli, K
    Aarik, J
    Aidla, A
    Forsgren, K
    Sundqvist, J
    Hårsta, A
    Uustare, T
    Mändar, H
    Kiisler, AA
    CHEMISTRY OF MATERIALS, 2001, 13 (01) : 122 - 128
  • [6] A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films
    Boysen, Nils
    Misimi, Bujamin
    Muriqi, Arbresha
    Wree, Jan-Lucas
    Hasselmann, Tim
    Rogalla, Detlef
    Haeger, Tobias
    Theirich, Detlef
    Nolan, Michael
    Riedl, Thomas
    Devi, Anjana
    CHEMICAL COMMUNICATIONS, 2020, 56 (89) : 13752 - 13755
  • [7] Atomic Layer Deposition on Polymer Thin Films: On the Role of Precursor Infiltration and Reactivity
    Petit, Robin R.
    Li, Jin
    Van de Voorde, Babs
    Van Vlierberghe, Sandra
    Smet, Philippe F.
    Detavernier, Christophe
    ACS APPLIED MATERIALS & INTERFACES, 2021, 13 (38) : 46151 - 46163
  • [8] Synthesis and characterization of PbTe thin films by atomic layer deposition
    Zhang, K.
    Pillai, A. D. Ramalingom
    Tangirala, M.
    Nminibapiel, D.
    Bollenbach, K.
    Cao, W.
    Baumgart, H.
    Chakravadhanula, V. S. K.
    Kuebel, C.
    Kochergin, V.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2014, 211 (06): : 1329 - 1333
  • [9] Atomic layer deposition of thin hafnium oxide films using a carbon free precursor
    Conley, JF
    Ono, Y
    Tweet, DJ
    Zhuang, W
    Solanki, R
    JOURNAL OF APPLIED PHYSICS, 2003, 93 (01) : 712 - 718
  • [10] Cobalt metal thin films: Precursor syntheses, atomic layer deposition, and selective growth
    Winter, Charles
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2017, 253