Carbon stripper foil preparation by ion beam sputtering with 3.5 keV Kr ions

被引：10
|
作者：
Sugai, I [1 ]
Oyaizu, M [1 ]
Kawakami, H [1 ]
Hattori, T [1 ]
Tomizawa, H [1 ]
Kawasaki, K [1 ]
机构：
[1] TOKYO INST TECHNOL,MEGURO KU,TOKYO 152,JAPAN
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 1997年 / 397卷 / 01期
关键词：
carbon stripper; electron diffraction; purity of target; sputtering; stripper lifetime; vacuum deposition;
D O I：
10.1016/S0168-9002(97)00763-8
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Heavy ion-beam sputtering with low beam voltage was found to be applicable for the preparation of long-lived carbon stripper foils. A test foil (25 mu g/cm(2)) made by this method survived an integrated ion current of 6213 mC/cm(2) corresponding a lifetime of about 200 times the best commercially available foil made by evaporation-condensation. The present method can be expected to be applicable to magnetron sputtering for mass production of carbon stripper foils.
引用
收藏
页码：137 / 139
页数：3
相关论文
共 50 条
  • [41] Development of a Faraday cup fast ion loss detector for keV beam ions
    Lazerson, Samuel A.
    Ellis, Robert
    Freeman, Chris
    Ilagan, Jessica
    Wang, Tianyao
    Shao, Lin
    Allen, Nicole
    Gates, David
    Neilson, Hutch
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2019, 90 (09):
  • [42] Deposition of silicon carbon nitride films by ion beam sputtering
    Wu, JJ
    Wu, CT
    Liao, YC
    Lu, TR
    Chen, LC
    Chen, KH
    Hwa, LG
    Kuo, CT
    Ling, KJ
    THIN SOLID FILMS, 1999, 355 : 417 - 422
  • [43] Deposition of silicon carbon nitride films by ion beam sputtering
    Wu, J.-J.
    Wu, C.-T.
    Liao, Y.-C.
    Lu, T.-R.
    Chen, L.C.
    Chen, K.H.
    Hwa, L.-G.
    Kuo, C.-T.
    Ling, K.-J.
    Thin Solid Films, 1999, 355 : 417 - 422
  • [44] Carbon nitride films synthesized by dual ion beam sputtering
    Prieto, P
    Quiros, C
    Elizalde, E
    Fernandez, A
    Martin, JM
    Sanz, JM
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 122 (03): : 534 - 537
  • [45] Sputtering of high-energy metal ions in keV heavy-ion surface collisions
    van Someren, B
    Nuver, TT
    Rudolph, H
    van Emmichoven, PAZ
    Urazgil'din, IF
    Niehaus, A
    SURFACE SCIENCE, 1999, 423 (2-3) : 276 - 291
  • [46] Sputtering of high-energy metal ions in keV heavy-ion surface collisions
    Van Someren, B.
    Nuver, T.T.
    Rudolph, H.
    Zeijlmans Van Emmichoven, P.A.
    Urazgil'din, I.F.
    Niehaus, A.
    Surface Science, 1999, 423 (02): : 276 - 291
  • [47] Effect of deformation nanostructuring of nickel and copper on ion sputtering with a focused gallium ion beam with an energy of 30 keV
    Khisamov, R. K.
    Nazarov, K. S.
    Irzhak, A., V
    Shayakhmetov, R. U.
    Musabirov, I. I.
    Timirayev, R. R.
    Yumaguzin, Y. M.
    Mulyukov, R. R.
    LETTERS ON MATERIALS, 2019, 9 (02): : 212 - 217
  • [48] MAGNETIC AND STRUCTURAL CHARACTERISTICS OF FE/AL MULTILAYERS DEPOSITED BY ION-BEAM SPUTTERING WITH KR
    HAMAGUCHI, T
    AIDA, H
    NAKAGAWA, S
    NAOE, M
    JOURNAL OF APPLIED PHYSICS, 1993, 73 (10) : 6444 - 6446
  • [49] SPUTTERING BEHAVIOR OF VANADIUM SILICIDE SINGLE-CRYSTALS UNDER 10 KEV KR+ ION-BOMBARDMENT
    WEISSBRODT, P
    STORBECK, F
    HAUFFE, W
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1984, 81 (01): : 259 - 265
  • [50] SIMPLE ION-SOURCE FOR TARGET PREPARATION VIA ION-BEAM SPUTTERING
    NOLEN, JA
    CURTIN, MS
    DYSON, TE
    NUCLEAR INSTRUMENTS & METHODS, 1978, 150 (03): : 581 - 583
12345