Carbon stripper foil preparation by ion beam sputtering with 3.5 keV Kr ions

被引：10

作者：

Sugai, I ^{[1
]}

Oyaizu, M ^{[1
]}

Kawakami, H ^{[1
]}

Hattori, T ^{[1
]}

Tomizawa, H ^{[1
]}

Kawasaki, K ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,MEGURO KU,TOKYO 152,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 1997年 / 397卷 / 01期

关键词：

carbon stripper; electron diffraction; purity of target; sputtering; stripper lifetime; vacuum deposition;

D O I：

10.1016/S0168-9002(97)00763-8

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Heavy ion-beam sputtering with low beam voltage was found to be applicable for the preparation of long-lived carbon stripper foils. A test foil (25 mu g/cm(2)) made by this method survived an integrated ion current of 6213 mC/cm(2) corresponding a lifetime of about 200 times the best commercially available foil made by evaporation-condensation. The present method can be expected to be applicable to magnetron sputtering for mass production of carbon stripper foils.

引用

页码：137 / 139

页数：3

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