TEM study of defects generated in 4H-SiC by microindentations on the prismatic plane

被引:9
|
作者
Mussi, A. [1 ]
Demenet, J. L. [1 ]
Rabier, J. [1 ]
机构
[1] Univ Poitiers, SP2MI, CNRS,UMR 6630, Met Phys Lab, F-86962 Futuroscope, France
关键词
D O I
10.1080/09500830600930198
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The deformation microstructure of single crystals of 4H-SiC resulting from microindentations on a prismatic surface was investigated by TEM. Indentations were performed at 400 and 675 degrees C, i.e. below the brittle to ductile transition temperature of 4H-SiC ( temperature close to 1100 degrees C). TEM analysis reveals dissociated dislocations as well as extended stacking faults in the basal plane. In addition, perfect edge dislocations are observed on prismatic planes. From the observations, it is assumed that perfect dislocations are nucleated in the prismatic plane and cross-slip on the basal one where they dissociate.
引用
收藏
页码:561 / 568
页数:8
相关论文
共 50 条
  • [41] Ion implantation induced defects in epitaxial 4H-SiC
    Hallén, A
    Henry, A
    Pellegrino, E
    Svensson, BG
    Åberg, D
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1999, 61-2 : 378 - 381
  • [42] Structures and energetics of defects: a comparative study of 3C-and 4H-SiC
    Gao, F
    Posselt, M
    Belko, V
    Zhang, Y
    Weber, WJ
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2004, 218 : 74 - 79
  • [43] Study of Defects in 4H-SiC Epitaxy at Various Buffer Layer Growth Conditions
    Rana T.
    Wu J.
    Chung G.
    Moeggenborg K.
    Gave M.
    Defect and Diffusion Forum, 2023, 425 : 63 - 68
  • [44] Native point defects and carbon clusters in 4H-SiC: A hybrid functional study
    Kobayashi, Takuma
    Harada, Kou
    Kumagai, Yu
    Oba, Fumiyasu
    Matsushita, Yu-ichiro
    JOURNAL OF APPLIED PHYSICS, 2019, 125 (12)
  • [45] TEM observations of 4H-SiC deformed at room temperature and 150°C
    Demenet, JL
    Milhet, X
    Rabier, J
    Cordier, P
    SILICON CARBIDE AND RELATED MATERIALS 2003, PRTS 1 AND 2, 2004, 457-460 : 343 - 346
  • [46] TEM Observation Of SiO2/4H-SiC Hetero Interface
    Matsuhata, Hirofumi
    Senzaki, Junji
    Nagai, Ichiro
    Yamaguchi, Hirotaka
    SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2, 2009, 600-603 : 671 - 674
  • [47] TEM of dislocations in forward-biased 4H-SiC PiN diodes
    Zhang, M
    Lendenmann, H
    Pirouz, P
    SILICON CARBIDE AND RELATED MATERIALS 2003, PTS 1 AND 2, 2004, 457-460 : 359 - 362
  • [48] Comparing basal and prismatic slips induced by thermal stresses in 4H-SiC crystals
    Lu, Sheng'ou
    Xu, Binjie
    Xuan, Lingling
    Pi, Xiaodong
    Yang, Deren
    Han, Xuefeng
    CRYSTENGCOMM, 2024, 26 (44) : 6244 - 6254
  • [49] A photoemission study of 4H-SiC(0001)
    Johansson, LI
    Owman, F
    Martensson, P
    SURFACE SCIENCE, 1996, 360 (1-3) : L483 - L488
  • [50] The study of Ni/4H-SiC SBD
    Zhang, YM
    Zhang, YM
    Niu, XJ
    SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1 AND 2, PROCEEDINGS, 2001, : 1187 - 1190